Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsien-Chie Tsai

Chang-Sheng Lee

Hung-Yin Lin

Wen-Che Chang

Chien-Pin Hsu

Fu-Yuan Chang

A method for controlling processing temperature in semiconductor fabrication is provided. The method includes detecting temperature in a first chamber configured to process a semiconductor wafer. The method further includes creating a flow of heat-exchange medium in a second chamber which is connected to the first chamber to cool the first chamber. The method also includes controlling the flow of heat-exchange medium according to the temperature detected in the first chamber by changing a covered area of a first ventilation unit which allows the entry of the heat-exchange medium to the second chamber.

Growing community of inventors

Taichung, Taiwan

Hsien-Chie Tsai