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Hsiao-Lei Wang

Neng-Tai Shih

Kao-Mei Sung

An epitaxial substrate having a 2D material interposer, the epitaxial substrate extending along an epitaxial interface direction, wherein the epitaxial substrate includes: a polycrystalline base substrate having a superficial layer, a wafer bevel, and a back surface, wherein a difference in coefficient of thermal expansion between the polycrystalline base substrate and MN or GaN is not greater than 1.5×10° C.in a direction parallel to the epitaxial interface; a multi-orientation 2D ultra-thin material interposer arranged on the superficial layer of the polycrystalline base substrate, wherein the multi-orientation 2D ultra-thin material interposer has a top layer, a lattice constant of the top layer being highly matched with that of AlN, AlGaN, or GaN; and an AlN, AlGaN, or GaN-based epitaxial layer, which is epitaxially grown on a portion of the multi-orientation 2D ultra-thin material interposer distant from the polycrystalline base substrate.

Epitaxial substrate having a 2D material interposer, method for manufacturing the epitaxial substrate, and device prepared from the epitaxial substrate

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Taoyuan, Taiwan

Hsiao-Lei Wang