Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsiang-Yin Shen

Chi-Feng Tung

Ching-Jung Chang

Mao-Lin Kao

Jiun-Rong Pai

Hsu-Shui Liu

Fu-Hsien Li

Tien-Chen Hu

Guancyun Li

Li-Jen Ko

Guan-Cyun Li

Rong-Syuan Fan

Chin-Hsiang Lin

Chieh Hsu

Chih-Cheng Hsiao

A method includes: storing a carrier containing material in a storage; recording environmental data of the storage to a database while the material is in the storage; generating a forecast for the material in the carrier based on the environmental data; receiving a request for the material from a semiconductor fabrication tool; and providing the carrier to the semiconductor fabrication tool based on the forecast.

Material management method and system

An overhead transport system is provided capable of absorbing abnormal vibration and determining a source of the abnormal vibration. The overhead transport system in accordance with various embodiments of the present disclosure includes a processor, an overhead rail, a plurality of hangers that support the overhead rail, a vibration meter measuring vibration from the overhead rail, and a damper included in each of the hangers. The processor is configured to change a property of the damper in response to a determination that the measured vibration by the vibration meter is indicative of an abnormal vibration.

Overhead transport system

An EUV stocker and an EUV pod device is disclosed. The EUV stocker includes an AI driven dynamic control circuitry, an AI controlled safety interlock, and an independent air return control device. The EUV stocker includes a Mass Flow Control (MFC) that operates in conjunction with one or more valves. The EUV stocker further includes a hydrocarbon detecting assembly, oxygen detecting assembly, pressure detecting assembly, and temperature detecting assembly and more to maintain the required condition within the EUV stocker. The EUV stocker also includes automated transportation devices such as AMHS, OHT, MR, AGV, RGV, or the like to provide a safe EUV mask storage environment for operators.

Storage for extreme ultraviolet light lithography

A stocking system is provided. The stocking system includes a wafer carrier, a stocking unit, a plurality of pod stoppers and at least one positioning pin. The stocking unit is configured to store the wafer carrier, and includes a carrying plate for carrying the wafer carrier. The pod stoppers stand on an edge of the carrying plate. The at least one positioning pin is disposed on a front portion of the carrying plate, such that the wafer carrier leans against the at least one positioning pin and is tilted toward a back portion of the carrying plate.

Stocking system

A stocker for storing a plurality of wafer carriers is provided. The stocker includes a frame, a plurality of pod stoppers, a plurality of truss members and a plurality of partitions. The frame includes a plurality of stocking units. Each of the stocking units includes a carrying plate for carrying one of the plurality of wafer carriers. The pod stoppers stand on an edge of each of the carrying plates. The truss members are disposed diagonally across at least one side surface of at least one of the stocking units, wherein each of the truss members comprises a shock absorber. The partitions are disposed on side surfaces of the stocking units and fixed to the frame.

Stocker

A photolithography system includes a photo-mask storage, at least one photolithography machine and an overhead crane for transporting at least one photo-mask at least between the photo-mask storage and the photolithography machine. The overhead crane includes at least one main rail, a mask girder, a mask hoist and a mask holding device. The mask girder is coupled with the main rail and movable at least between a first position above the photo-mask storage and a second position above the photolithography machine. The mask hoist is movably coupled with the mask girder. The mask holding device is coupled with the mask hoist.

Photolithography system, method for transporting photo-mask and unit therein

A semiconductor processing station is provided. The semiconductor processing station includes a first platform, a second platform and a vacuum tunnel, wherein the first platform has a first load lock and a first plurality of chambers, and the second platform has a second load lock and a second plurality of chambers, and the vacuum tunnel connects the first and the second load locks.

Method for processing semiconductor wafer

Semiconductor processing station and method for processing semiconductor wafer

A rail transport system and method for a semiconductor fabrication facility (FAB). In one embodiment, the system includes a network of stationary rails and a wheeled vehicle movable on the rails via rolling movement. The vehicle is operable to hold a wafer carrier that stores a plurality of wafers. A cross-floor transport system is provided that may include a vehicle lifter positioned near the network of rails that extends between a first elevation and a second elevation in the FAB. The lifter is configured and operable to receive the vehicle from rails at the first elevation and vertically transport the vehicle to rails at the second elevation without removing the wafer carrier from the wheeled vehicle. In one embodiment, the lifter is configured so that the vehicle may be rolled directly onto and off of the lifter for vertical transport.

Growing community of inventors

Hsinchu, Taiwan

Hsiang-Yin Shen