Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsiang-Chung Liu

Shih-Shiung Chen

Chia-Hsiang Chen

Li-Kong Turn

Chih-Chien Hung

Han-Ming Sheng

Ming-Huei Tseng

Chun-Mei Lee

De-Ming Liang

A frame layout and method for determining the overlay accuracy of a first chip image relative to a second chip image when the first and second chip images are used to form a single chip. One embodiment employs a vernier scale in two orthoginal directions included in the scribeline of both the first chip image and the second chip image. Another embodiment employs a box in box pattern included in the scribeline of both the first chip image and the second chip image. A layer of photoresist on an integrated circuit wafer is exposed with the first and second chip image and the associated monitor images. When the photoresist is developed the overlay accuracy of the first chip image relative to the second chip image can be determined directly from the monitor images in the photoresist.

Frame layout to monitor overlay performance of chip composed of multi-exposure images

A new method of preventing passivation keyhole damage and resist extrusion using a hydrophillic solvent before photoresist coating is described. Semiconductor device structures are formed in and on a semiconductor substrate and covered by an insulating layer. Metal lines are formed overlying the insulating layer wherein there is a gap between two of the metal lines. A passivation layer is deposited overlying the metal lines wherein the gap is not filled completely by the passivation layer. The passivation layer is coated with a hydrophillic solvent wherein the hydrophillic solvent completely fills the gap. The passivation layer is coated with a photoresist layer which is exposed and developed to form a photoresist mask. The hydrophillic solvent completely filling the gap allows a uniform thickness photoresist layer. The passivation layer is etched away where it is not covered by the photoresist mask where a bonding pad is formed.

Method to prevent passivation from keyhole damage and resist extrusion

Growing community of inventors

Jwu Beei, Taiwan

Hsiang-Chung Liu