Asml Netherlands B.v.

Hrishikesh Patel

Johannes Henricus Wilhelmus Jacobs

Marcio Alexandre Cano Miranda

Gerardus Adrianus Antonius Maria Kusters

Johannes Petrus Martinus Bernardus Vermeulen

Johan Hendrik Klootwijk

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Paul Janssen

Pieter-Jan Van Zwol

Antonius Franciscus Johannes De Groot

Mária Péter

David Ferdinand Vles

Arnoud Willem Notenboom

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Adrianus Johannes Maria Giesbers

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Evgenia Kurganova

Aleksandar Nikolov Zdravkov

Gerrit Van Den Bosch

Chaitanya Krishna Ande

Hendrikus Jan Wondergem

Peter Simon Antonius Knapen

Wouter Rogier Meijerink

Peng Feng

Marcel Peter Meijer

Johannes Joseph Janssen

Raymond Olsman

Franciscus Johannes Joseph Janssen

Ruud Hendrikus Martinus Johannes Bloks

Ruud Hendricus Martinus Johannes Bloks

Nicolaas Ten Kate

Raymond Wilhelmus Louis Lafarre

Markus Franciscus Antonius Eurlings

Paulus Martinus Maria Liebregts

Ronald Van Der Ham

Koen Steffens

Jozef Petrus Henricus Benschop

Niek Jacobus Johannes Roset

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Daniel Jozef Maria Direcks

Paul Petrus Joannes Berkvens

Hermanus Johannes Maria Kreuwel

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Joris Johan Anne-Marie Verstraete

Matheus Anna Karel Van Lierop

Maikel Adrianus Cornelis Schepers

Alexander Nikolov Zdravkov

Maarten Kees Jan Boon

Bernard Jacob Andries Stommen

Gert-Jan Geradus Johannes Thomas Brands

Pepijn Wijnand Jozef Janssen

Jacob Cohen

Sander Van Opstal

Bernard Stommen

Maikel Schepers

Franciscus Janssen

Maarten Boon

Markus Eurlings

Pepijn Janssen

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

Lithographic apparatus and a device manufacturing method

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Lithographic apparatus and a device manufacturing method involving thermal conditioning of a table

A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method

A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.

Radiation conduit for radiation source

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

Fluid handling structure, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Hrishikesh Patel