Samsung Electronics Co., Ltd.

HoSun Yoo

Sungyeol Kim

Minsung Kim

Jinyeong Yun

Jang-Yeob Lee

Sungjin Kim

Hyunjung Lee

Junghwan Kim

Sunghyup Kim

Injae Lee

Jeonggil Kim

Sunho Kim

Jungwook Kim

Yongchan Kim

Dongkyeng Han

Sungwook Jung

Joohee Kim

Ohkug Kwon

Ouiserg Kim

Daerim Choi

A fastening automation apparatus for an upper electrode of an etching facility includes a ring, and a plurality of fastening modules movably secured to the ring and configured to be movable in a radial direction on the ring. Each fastening module includes a first frame that is movable in a radial direction on the ring, a driving source installed below the first frame, a driving shaft that transmits a driving force from the driving source, a power transmission unit connected to the driving shaft, and a fastening bit connected to the power transmission unit and configured to be rotated. The plurality of fastening modules are configured to operate simultaneously to install the upper electrode in the etching facility.

Fastening automation apparatus for upper electrode

A plasma processing apparatus includes a chamber providing a space for processing a substrate, a substrate stage configured to support the substrate within the chamber and including a lower electrode, an upper electrode facing the lower electrode, a focus ring in or on an upper peripheral region of the substrate stage to surround the substrate, and a plasma adjustment assembly in at least one of a first position between the upper electrode and the lower electrode and a second position between the focus ring and the lower electrode, the plasma adjustment assembly including a photoreactive material layer and a plurality of light sources configured to irradiate light onto a local region of the photoreactive material layer. A capacitance of the local region is changed as the light is irradiated to the local region.

Plasma processing apparatus and plasma processing method

An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

Apparatus for generating extreme ultraviolet light and lithography apparatus including the same

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Seongnam-si, South Korea

HoSun Yoo