Leybold-Heraeus Gmbh

Leybold Aktiengesellschaft

Other

Horst Ranke

Volker Bauer

Albert Feuerstein

Walter Dietrich

Josef Heimerl

Reinhardt Kraft

Hans Aichert

Gernot Thorn

Claus Heuser

Aljet Harberts

Herman Stumpp

The invention pertains to a process for the control of the strike positions of a plurality of electron beams on a melting bath. In this case, the light beams issuing from the surface of the melting bath are sent to a radiation splitter, the separated beams of which, as the case may be, are sent via additional radiation splitters to photoelectric sensors. The output signals of these sensors are sent to a control, which guides the electron beam guns, from which the electron beams issue.

Process for controlling the strike positions of a plurality of electron

An apparatus for melting metals in a vacuum chamber has a weir box (1), electron beam generators disposed above the weir box, and a crucible for the withdrawal of the melt flowing out of the weir box. A weir or sill is disposed in the trough athwart the length thereof, and it divides the trough into two basins and is situated underneath the one electron-beam source. The melt flowing from the one basin into the other runs in a thin film over the top of the weir or notch while the titanium nitrite in the melt is dissolved.

Apparatus for the melting of metals

An electron gun with one directly heatable initial cathode (2), one indirectly heatable second blocking cathode (3) and one focusing electrode (17). The focusing electrode (17) presents an initial centering region (18) and, by means of supporting braces, the blocking cathode (3) is fixed concentrically in a carrier ring (19) presenting a second centering region complementary to the first centering region (18). This permits the blocking cathode (3) to be introduced into the focusing electrode from the back by means of the carrier ring (19), and the carrier ring (19) is secured by means of a locking ring (24).

Electron gun with one directly heatable and one indirectly heatable

The nominal position value for the impact point of an electron beam on a medium located in a crucible is input to a device having a screen on which the contours of the crucible are represented. Light pen means establish a plurality of nominal positions of impact of the electron beam within the represented contours of the crucible.

Device for the input of a nominal value for the impact point of an

In a mounting device for electrically heated, spirally wound wire cathodes in electron guns, two mounting posts joined together by an insulator are configured as sector-shaped sections of a hollow cylinder, and have each a circumferential groove on its end remote from the insulator. The surfaces defining the grooves are parts of common circular and cylindrical surfaces, and the mounting ends of the cathodes are of a configuration approximately complementary to that of the grooves in the mounting posts. The mounting ends therefore lie in a spring-biased and form-fitting manner in the circumferential grooves.

Mounting means for mounting spiral wire cathodes

A vaporization arrangement for coating substrates disposed in an areal region, or past through an areal region, comprises a rectangular vaporization crucible with a crucible rim, as well as plurality of electron guns each having an X-Y deflecting system. The electron guns are disposed on one side of the drucible axis separately from the crucible in such a manner that their beam axis extend parallel to one another and are directed on a plane passing vertically through the longitudinal axis of the crucible. The arrangement further comprises means for deflecting the electron means onto the surface of the contents of the crucible. Such means include an alternating serial arrangement of linear coils, on the side of the crucible opposite to the electron guns, and pole plates disposed both between the linear coils and at their ends. The pole plates at the ends of a linear coil in each case assume such a position relative to an opposite electron gun, such that the beam axis is substantially in a perpendicular plane of symmetry between the pole plates.

Vaporization arrangement with a rectangular vaporization crucible and

In vacuum depositing apparatus, especially for the manufacture of magnetic tapes, a substrate holder is disposed in the form of a cooling cylinder, and in the path of the vapor stream there is a mask for the purpose of geometrically restricting the vapor stream. In order to prevent any condensation of vaporized material in solid form, the surface of the mask facing the vapor stream is not aligned horizontally, and its lowermost edge lies within the projected surface of the crucible opening. The surface of the mask can be heated up to a temperature that is between the vaporizing temperature and the solidification temperature of the vaporized material. In an especially advantageous manner, the surface of the mask is formed by tiles of a ceramic material.

Vacuum depositing apparatus

A method and system for a vacuum-evaporative film-deposition process displays bar charts of the local evaporation power of each vapor source in the process and the film thickness deposited thereby in spatial coordination on a single display screen.

Method and system for a vacuum evaporative deposition process

Evaporator crucible for vacuum depositing systems, having a crucible bottom with at least one bottom opening for the introduction of material in rod form for evaporation. At a distance from the bottom opening there is provided at least one metal crucible rim which preferably is provided with a coolant passage. To solve the problem of reducing the heat losses, the crucible rim is provided internally on at least a part of its depth with a lagging comprising ceramic material. This lagging preferably comprises individual ceramic building blocks which are preferably compressed from magnesium oxide.

Evaporator crucible for vacuum depositing systems

An electron beam vaporizer with an electron beam generator (1), a first magnetic deflector system (7) with parallel elongate pole plates (8) for linear beam deflection along a first coordinate, and with a second magnetic deflector system (10) for beam deflection along a second coordinate, perpendicular to the first coordinate. An elongate vaporizing crucible (6) holds the material to be vaporized. To solve the problem of maintaining focus even over large deflection angles and to be able to correct the deflection pattern, the invention proposes the following:

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Alzenau, Germany

Horst Ranke