Ciba-geigy Corporation

Robert Boschgmbh

Horst Munzel

Reinhard Schulz

Ekkehard Bartmann

Markus Lutz

Michael Offenberg

Klaus Heyers

Eckhard Graf

Bernhard Elsner

Heinz-Georg Vossenberg

Nicholas Buchan

Helmut Skapa

Method of producing acceleration sensors

Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least

Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl

Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) ##STR1## wherein one of the substituents X is hydrogen or a group of formula II ##STR2## and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III ##STR3## wherein X is a direct bond, --O--, --S--, --SO.sub.2 --, --CO-- or C(R.sub.6 (R.sub.7)--, and R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or hydroxy, and R.sub.6 and R.sub.7 are each independently of the other hydrogen, --CH.sub.3 or --CF.sub.3. These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.

Photoresist composition containing specific amounts of a naphthoquinone

The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinonediazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.

Positive photoresist composition containing alkali-soluble phenolic

Positive photoresist containing 2,3,4-trihydroxybenzophenone and

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Reutlingen, Germany

Horst Munzel