Carl Zeiss Smt Gmbh

Carl Zeiss Laser Optics Gmbh

Horst Feldermann

Jeffrey Erxmeyer

Konstantin Forcht

Alexandra Pazidis

Vitaliy Shklover

Johannes Kraus

Michael Schall

Oliver Gloeckl

Ute Heinemeyer

Christoph Zaczek

Peter Huber

Frank Weigl

A reflective optical element, in particular for a DUV or VUV operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system () includes a layer (L) of material having a lower refractive index nat the operating wavelength, a layer (H) of material having a higher refractive index nat the operating wavelength and a layer (M) of material having a refractive index nat the operating wavelength, where n&#x3c;n&#x3c;n. The layer (M) is arranged at at least one transition from a layer (L) to a layer (H) and/or from a layer (H) to a layer (L). The dielectric layer system has a four-layer sequence of (LMHM)m or (HMLM)m, where m is equal to the number of four-layer sequences in the dielectric layer system.

Reflective optical element

In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein

Optical element

A mirror with a dielectric coating () on a substrate (), wherein the dielectric coating () has exactly two layer stacks (), a first layer stack (), on the substrate, of layers () of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (), arranged thereon, of layers of fluorides () and oxides () in alternating arrangement, and wherein the number of fluoride layers () as a proportion of the total number of layers of the dielectric coating () is less than 0.45.

Mirror with dielectric coating

An optical element () for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (), a reflective layer () made of aluminum superimposed on the substrate (). The reflective aluminum layer () is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element () has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10&#xb0;, preferably of at least 15&#xb0;, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.

Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same

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Aalen, Germany

Horst Feldermann