Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Korea Advanced Institute of Science and Technology

Yonsei University

Sovargen Co., Ltd.

Sungkyunkwan University

Hoon Chul Kang

Jin-Ho Ju

Yang-Ho Jung

Jin-soo Lee

Hyung-Jin Choi

Jae-Sung Kim

Dong-Ki Lee

Sung-Chul Kang

Yong-Hwan Shin

Dong Seok Kim

You-Kyoung Lee

Seung-Uk Lee

Jae Seok Lim

Swae-Hyun Kim

Yeo-Geon Yoon

Se Hoon Kim

Hee-Jin Roh

Hong-Jo Park

Se-Bin Im

Jun-Kyu Kang

Su-Jin Yoon

Jeong Ho Lee

Jae-Hwa Park

Sung-Hee Hong

Byung-uk Kim

Jeoung-Gil Lee

Hyo-Youl Kim

Woo-Il Kim

Dae-Hong Lee

Chang-Hyun Baik

Provided is a use of the prophylaxis, amelioration or therapy of intractable epilepsy, for example, Focal Cortical Dysplasia (FCD).

Composition for prevention or treatment of intractable epilepsy comprising mTOR inhibitor

The present invention relates to a technique for inducing epilepsy and a non-human animal model of epilepsy. More particularly, the present invention relates to a method for inducing epilepsy in an animal, a non-human animal model of epilepsy, and a method for manufacturing the same.

Animal model for epilepsy and method for producing the same

A display substrate includes a base substrate, a thin-film transistor (TFT), a color filter and a pixel electrode. The TFT is on the base substrate. The color filter is on the base substrate including the TFT and in contact with the base substrate. The pixel electrode is on the color filter and in electrical connection to a drain electrode of the TFT.

Display substrate, method of manufacturing the same and display apparatus having the same

The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits. The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

Photoresist composition for multi-micro nozzle head coater

Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.

Photoresist composition and method of forming pattern using the same

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Seoul, South Korea

Hoon Chul Kang