Beijing Boe Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Hongxi Xiao

Haisheng Zhao

Chong Liu

Xiaoguang Pei

Zhilian Xiao

Jae Yun Jung

Wei Wang

Zhilong Peng

Ping Wu

Huafeng Liu

Jeong Hun Rhee

Zuhong Liu

Taek Ho Hong

Shunkang Su

Hanting Ding

Wei Li

Zhi Hou

Huanping Liu

Jiapeng Li

Yunyou Zheng

Haitao Ma

Huigang Jiang

The embodiments of the present disclosure provide a photoelectric detector, a method for manufacturing the photoelectric detector, and a detection device. The method for manufacturing the photoelectric detector includes: forming a thin film transistor array layer on a base substrate; forming an organic layer on a side of the thin film transistor array layer facing away from the base substrate; and patterning the organic layer to form a first via hole which enables a signal transmission layer in the thin film transistor array layer to be exposed; and depositing a photoelectric conversion device in the first via hole.

Photoelectric detector, manufacturing method thereof, and detection device

An array substrate, a method for fabricating the same, a display panel and a display device are disclosed. The array substrate comprises leading wires, the plurality of leading wires form a plurality of grooves in a fanout area of the array substrate, the plurality of grooves are filled with a filler, and the filler filled in the grooves has an upper surface which is flush with leading wires surrounding the grooves. The filler is made from an insulating and transparent material.

Array substrate and method for fabricating the same, display panel and display device

An array substrate includes a substrate, a first signal line and a second signal line on the substrate, an insulating layer covering the first signal line and the second signal line, and a groove penetrating through the insulating layer. The first signal line and the second signal line are arranged in a same layer and separated from each other. The groove is between the first signal line and the second signal line.

Array substrate, fabrication method and display device

A method of manufacturing an array substrate assembly and an array substrate assembly manufactured by the method are disclosed. The method includes: manufacturing a gate metal layer on a substrate, the gate metal layer including a gate line and a common electrode signal line spaced from each other; forming a gate insulating layer, an active layer, a source-drain electrode layer, a passivation layer, and a protective pattern on the gate metal layer; and forming, in the passivation layer and the gate insulating layer, a via hole configured for a connection to the common electrode signal line. An orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the via hole on the substrate partly coincide with each other, and the orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the gate line on the substrate partly coincide with each other.

Array substrate assembly and method of manufacturing the same

The present invention provides an array substrate, a method of fabricating the array substrate, and a display device. The method of fabricating the array substrate of the present invention comprises steps of: sequentially forming a first transparent conductive film and a source-drain metal film on a substrate; forming a source-drain metal pattern by performing a patterning process on the source-drain metal film; forming a pattern comprising a pixel electrode and a compensation structure that is provided below the source-drain metal pattern by performing a patterning process on the first transparent conductive film.

Array substrate and method of fabricating the same, and display device

A Thin Film Transistor-Liquid Crystal Display (TFT-LCD) array substrate is presented which includes a gate line, a data line, and a pixel electrode. The pixel electrode is disposed in a pixel region defined by the intersection between the gate line and the data line. In the pixel region, a partition groove for forming a pixel electrode pattern is provided at the periphery of the pixel electrode.

TFT-LCD array substrate

The present invention relates to a method for manufacturing a mother substrate, the mother substrate comprising: a substrate comprising at least one display region and pre-cutting regions in a periphery of the display region, wherein the display region comprises gate scanning lines and data scanning lines, the pre-cutting regions comprise a gate-line connecting line and a data-line connecting line electrically connected to each other, and the gate-line connecting line is electrically connected to all of the gate scanning lines in the display region, and the data-line connecting line is electrically connected to all of the data scanning lines in the display region substrate.

Method for manufacturing mother substrate and array substrate

The present invention relates to a mother substrate and a method for manufacturing the same, the mother substrate comprising: a substrate, comprising at least one display region and pre-cutting regions in a periphery of the display region, wherein the display region comprises gate scanning lines and data scanning lines, the pre-cutting regions comprise a gate-line connecting line and a data-line connecting line electrically connected to each other, and the gate-line connecting line is electrically connected to all of the gate scanning lines in the display region, and the data-line connecting line is electrically connected to all of the data scanning lines in the display region substrate.

Mother substrate, array substrate and method for manufacturing the same

A liquid crystal display (LCD) array substrate and a manufacturing method thereof are provided. The manufacturing method comprises depositing a semiconductor layer, a doped semiconductor layer and a metal film for source and drain electrodes sequentially on a base substrate and then forming a data line, a source electrode, a drain electrode and a thin film transistor (TFT) channel region by a first patterning process; depositing a first insulating film and a gate metal film sequentially and then forming a gate line and a gate electrode by a second patterning process and forming an insulating layer via hole in the first insulating layer above the drain electrode; depositing a transparent conductive film and then forming a pixel electrode by a third patterning process; and forming a second insulating layer.

TFT-LCD array substrate and manufacturing method thereof

A TFT-LCD array substrate and a manufacturing method thereof. The array substrate comprises a gate line, a data line, and a pixel electrode, and the pixel electrode is disposed in a pixel region defined by the intersection between the gate line and the data line. In the pixel region, a partition groove for forming a pixel electrode pattern is provided at the periphery of the pixel electrode. This structure is helpful to form a pixel electrode pattern by a lift-off process, which significantly reduces the production cost and improves the production yield.

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Beijing, China

Hongxi Xiao