Semiconductor Manufacturing International (Shanghai) Corporation

Ningbo Semiconductor International Corporation

Semiconductor Manufacturing International Corp.

Hongtao Ge

Herb He Huang

Haiting Li

Qiang Zhou

Xiaoyan Bao

A semiconductor device includes an inductor disposed on a surface of an intermetallic dielectric layer at a location below which no virtual interconnect members are present. Thus, parasitic capacitance is reduced or eliminated and the Q value of the inductor is high.

Inductor device

A semiconductor device and a method of manufacturing the semiconductor device are disclosed. The semiconductor device includes an inductor disposed on a surface of an intermetallic dielectric layer at a location below which no virtual interconnect members are present. Thus, parasitic capacitance is reduced or eliminated and the Q value of the inductor is high.

Inductor device and fabrication method

A method for forming a semiconductor device includes, sequentially, providing a substrate having a first region and a second region; forming a first dielectric layer on the substrate; forming a second dielectric layer having a plurality of first openings exposing portions of a top surface of the first dielectric layer; forming a first conductive layer in the first openings; etching the second dielectric layer and the first dielectric layer in the second region until the substrate is exposed to form a plurality of second openings; forming passivation regions in portions of the substrate exposed by the second openings; exposing the surface of the first dielectric layer in the second region; forming a third dielectric layer on the surface of the first dielectric layer and in the second openings; and forming a second conductive layer, a portion of which is configured as an inductor, over the third dielectric layer.

Semiconductor device and fabrication method thereof

A semiconductor device and method of fabricating the semiconductor device are provided. The semiconductor device includes a first substrate including a front-end device containing a transistor, a radio frequency (RF) device and a first interconnect structure, and a second substrate containing a cavity disposed at a location corresponding to a location of the RF device. The first substrate and the second substrate are bonded together such that the first surface of the first substrate is facing the cavity in the second substrate, and the cavity is over the RF device. Because of the cavity, the distance between the second substrate and the RF device is relatively large so that the second substrate has less impact on the performance of the RF device, thereby improving the performance of the semiconductor device.

Growing community of inventors

Shanghai, China

Hongtao Ge