Advanced Micro-Fabrication Equipment, Inc.

Hongqing Wang

Sheng Guo

Tuqiang Ni

Xingjian Chen

Xiang Sun

Ruoxin Du

Kuan Yang

Guangwei Fan

Disclosed is a plasma treatment apparatus, a lower electrode assembly and a forming method thereof, wherein the lower electrode assembly includes: a base for carrying a substrate to be treated; a focus ring encircling a periphery of the base; a coupling loop disposed below the focus ring; a conductive layer disposed in the coupling loop; and a wire for electrically connecting the conductive layer and the base so that the base and the conducting layer are equipotential. The lower electrode assembly is less prone to cause arc discharge.

Plasma treatment apparatus, lower electrode assembly and forming method thereof

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Shanghai, China

Hongqing Wang