US Government As Represented by the Secretary of the Army

Hongen Shen

Mitra Dutta

Jagadeesh Pamulapati

Arthur D Ballato

John A Kosinski

Yicheng Lu

Weimin Zhou

Gerald J Iafrate

Michael A Stroscio

Porous silicon is formed by patterning a single crystal silicon substrate prior to electrochemically etching the same. The process is a controlled method of fabricating silicon microstructures which exhibit luminescence and are useful in optoelectronic devices, such as light emitting diodes. The porous silicon produced has a high degree of uniformity and repeatability.

Method of forming porous silicon

An opto-electronic semiconductor device including a variable strained layered quantum well structure having at least two superimposed heavy- and light-hole triangular bottom valance band quantum wells with mutually opposite slopes. Upon the application of a bias potential across a thickness dimension of the quantum wells, an electric field is generated therethrough which produces an interchange of the confined energy levels of heavy-holes and light-holes in the quantum wells which causes a change in the transmission characteristics of light passing through the device as a result of the heavy- and light-hole energy bands having different light absorption anisotropy.

Tunable heavy and light hole coupled bands in variable-strain quantum

An optic modulator having a transparent piezoelectric substrate, an active multiple quantum well (MQW) epilayer with bottom electrical contacts bonded to the substrate, wherein the substrate is cut such that its thermal expansion coefficient is matched or roughly matched to that of the MQW epilayer in the direction parallel to the long axes of the bottom contacts and so that the piezoelectrically-active direction of the substrate is normal to the long axes of the bottom contacts. In order to control the bias of the MQW epilayer a transparent contact is disposed over the MQW epilayer. In operation, the piezoelectric substrate, when activated, will displace an anisotropic strain on the MQW epilayer which will break the rotational symmetry in the plane of the MQW. This will result in anisotropic mixing of the heavy and light holes in the MQW epilayer and thus, will result in an anisotropic excitonic absorption of light normal to the MQW epilayer.

Optical modulator based on piezoelectrically driven anisotropic optical

The present invention is a spatial light modulator which uses an uniaxially trained multiple quantum well (MQW) structure with an anisotropic absorption to rotate the polarization of light normal to the MQW structure. The anisotropy which produces this rotation is the result of a thermally induced in-plane anisotropic strain. The MQW light modulator based on this process has a high contrast ratio of 7000:1 and increased speed as compared to other similar modulators.

Uniaxially strained semiconductor multiple quantum well device using

A multiple quantum well optical modulator comprising a multiple quantum well structure embedded in the intrinsic region of an s-i-n+ semiconductor. The s-i-n+ structure causes an electric field to be applied to the multiple quantum well structure which causes uncoupling of the el energy confined level of one layer and the x level of the adjacent layer, thereby changing the absorption of the light and causing modulation thereof.

All optical multiple quantum well optical modulator

An optic modulator which employs strained multiple quantum well structures which are fabricated and spaced from one another such that the stress perpendicular to the direction of the spacing is released leaving only a uniaxial stress along the direction parallel to the spacing. The multiple quantum well structures are then sandwiched between two optic polarizers which are aligned perpendicular to one another. At zero electric field, polarized light passing from the first polarizer is further polarized such that the polarization of the light is rotated to pass through the second polarizer. When an electric field is applied across the heterostructure, light passing through the heterostructure is not further polarized and therefore, the optic signal is interrupted. Thus, optic signals may be modulated with the contrast of polarizing modulators at the speed of superlattice heterostructures.

Optic modulator with uniaxial stress

A sweeping photoreflectance spectroscopy technique and apparatus is disclosed. This technique and apparatus enable the determination of the band structure of semi conductors and other materials at low temperatures by the mechanism of modulating the photoreflectance signal in a predetermined manner thereby enabling its detection in the presence of a much larger, but continuous, undesirable photoluminescence signal.

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Howell, NJ, United States of America

Hongen Shen