Applied Materials, Inc.

Hongbee Teoh

Lawrence Chung-Lai Lei

Avgerinos V Gelatos

Salvador P Umotoy

Xiaoxiong Yuan

Anzhong Chang

Anh Ngoc Nguyen

Sal Umotoy

Ron L Rose

Mark M Hytros

Truc T Tran

A showerhead assembly for distributing gases within a processing chamber is provided. In one embodiment, the showerhead assembly includes a cylindrical member having a faceplate coupled thereto. The cylindrical member has an outwardly extending first flange at a first end. The faceplate is coupled to a second end of the cylindrical member and has a plurality of holes formed though a center region of the faceplate. The joint between the cylindrical member and the faceplate allow for relative movement when subjected to thermal stresses. In another embodiment, at least one clamp member retains the faceplate to the second end of the cylindrical member.

Showerhead assembly for a processing chamber

A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a top ceramic plate having a first side, a bottom ceramic plate having a first side and an embedded electrode, the first side of the bottom plate fused to the first side of the top plate defining a channel therebetween. In another embodiment, a support assembly includes a first plate having a first side and second side. A ring is disposed on the first side. A stepped surface is formed on the first side radially inward of the ring. A second plate is connected to the second side of the first plate.

Ceramic substrate support

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Saratoga, CA, United States of America

Hongbee Teoh