Eugene Technology Co., Ltd.

Skhynix Inc.

Semes Co., Ltd.

Proteina, Inc.

Proteina Co., Ltd.

Hong Won Lee

Sung Ho Kang

Chang Dol Kim

Jeong Hee Jo

Gyu Ho Choi

Yong Jin

Jong Hwan An

Shin-Woo Nam

Song Hwan Park

Jae Bak Shim

Youjin Na

Min Jin Jung

Joo Hyun Cho

Hyun Jun Yoo

Bo Sun Kim

Min Woong Kang

Tae Hwan Kim

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.

Apparatus for processing a substrate and method of operating the same

Disclosed are a method for analyzing an activation state of a signaling pathway in a cell or tissue through protein-protein interaction analysis, a method for selecting a tailored personal therapeutic agent and/or monitoring efficacy of a therapeutic agent using the analysis method, and a device for use therein.

Method and apparatus for analysis of protein-protein interaction

Disclosed are an apparatus for monitoring pulsed high-frequency power and a substrate processing apparatus including the same. The apparatus includes an attenuation module configured to attenuate a pulsed high-frequency power signal; a rectifier module configured to convert the pulsed high-frequency power signal into a direct current signal; and a detection module configured to detect a pulse parameter based on the direct current signal.

Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the same

Provided is a batch-type substrate processing apparatus which supplies, into a processing space, a process gas decomposed in a separate space. The substrate processing apparatus includes: a tube; a substrate support part; a gas supply pipe; an exhaust part; and a plasma reaction part, wherein the plasma part may include a plurality of power supply electrode parts and a ground electrode part.

Batch type plasma substrate processing apparatus

A substrate processing apparatus in accordance with an exemplary embodiments include: a first tube configured to provide a processing space in which a plurality of substrates are processed; a substrate support part configured to load the plurality of substrates in a first direction in the processing space; a plurality of gas supply parts provided with supply ports for supplying a process gas required for a process in which the substrates are processed; an exhaust part configured to communicate with the first tube and discharge process residues inside the processing space to the outside; and a plasma reaction part provided outside the first tube, and configured to decompose, with plasma, the process gas supplied from the gas supply part and provide the decomposed process gas to the processing space.

Plasma processing apparatus having injection ports at both sides of the ground electrode for batch processing of substrates

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Seoul, South Korea

Hong Won Lee