Xilinx, Inc.

Hong-Tze Pan

Zhiyuan Wu

Qi Lin

Jae-Gyung Ahn

Ping-Chin Yeh

Bang-Thu Nguyen

Yun Wu

Bei Zhu

An integrated circuit ('IC') fabricated on a semiconductor substrate has an active gate structure formed over a channel region in the semiconductor substrate. A dummy gate structure is formed on a dielectric isolation structure. The dummy gate structure and the active gate structure have the same width. A sidewall spacer on the dummy gate structure overlies a semiconductor portion between a strain-inducing insert and the dielectric isolation structure.

Integrated circuit with stress inserts

Growing community of inventors

Cupertino, CA, United States of America

Hong-Tze Pan