Samsung Display Co., Ltd.

Samsung Electronics Co., Ltd.

Samsung Displayco., Ltd.

Solum Co., Ltd.

Enf Technology Co., Ltd.

Digital Multimedia Technology Co., Ltd.

Hong Sick Park

Jong Hyun Choung

Hyun Eok Shin

Gyung Min Baek

Ju Hyun Lee

Bong Kyun Kim

Bong-Kyun Kim

Shin Il Choi

Sang Won Shin

Sun Young Hong

Byeong Jin Lee

Jong-Hyun Choung

Wang Woo Lee

Yong-Hwan Ryu

In-Bae Kim

Min Ho Moon

Jae Uoon Kim

Hyang-Shik Kong

Sang Gab Kim

Yeun Tae Kim

Ki-beom Lee

Joon Yong Park

Chang Oh Jeong

Ji Sun Lee

Seon-Il Kim

Chan Woo Yang

Dae Ho Kim

Sam-Young Cho

Seung Ho Yoon

Jae Woo Jeong

Young Min Moon

Ki Tae Kim

Byung Uk Kim

Seon-II Kim

Won Suk Shin

Seong Bae Kim

Jong Hyun Jeong

Sung Gun Shin

Soon Beom Huh

Se Hwan Jung

Doo Young Jang

Bong Kyu Shin

Hyun Sook Kim

Sung Hwan Won

Young Jin Park

Won Tae Kim

Seon Uk Lee

Sang-woo Kim

Seung-Ha Choi

Byeong-Jin Lee

Su Bin Bae

Sang Woo Sohn

Jung Ha Son

Dong Kyun Ryu

Seung Bae Kang

Joon Woo Bae

You Young Jin

Young Joo Choi

Sho Yeon Kim

Sang Gab Park

Dae-woo Lee

Gyu-po Kim

Won-guk Seo

Hyun-cheol Shin

Hee Sung Yang

Hyun Seo Park

Seung-yeon Han

Jong Wan Kim

Hyo Won Park

Sang In Jang

Sang Moon Yun

Sang Dai Lee

Suk Il Yoon

Suk Ii Yoon

Myoung J Go

A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.

Method of fabricating conductive pattern, display device, and method of fabricating display device

A display device includes: a substrate; a data line on the substrate; a first insulating layer on the data line; a first transistor on the first insulating layer; a second insulating layer on the first transistor; a pixel electrode on the second insulating layer, the pixel electrode being electrically connected to the first transistor; and an auxiliary data pattern on the second insulating layer as a same layer as the pixel electrode, the auxiliary data pattern being electrically connected to the data line.

Display device

A device includes a substrate including a display area and a pad area; a first conductive layer on the substrate; and a first insulating film on the first conductive layer, the first insulating film having a first contact hole in the display area to expose the first conductive layer and a pad opening exposing the first conductive layer in the pad area, the first conductive layer being arranged such that in a first region covered by the first insulating film, a second conductive capping layer of the first conductive layer is entirely on a first conductive capping layer of the first conductive layer; in a second region overlapping the contact hole, the second conductive capping layer is entirely on the first conductive capping layer; and in a third region exposed by the pad opening, the second conductive capping layer exposes at least a portion of the first conductive capping layer.

A display device may include a first base, a metal oxide layer overlapping a face of the first base, and a conductive metal layer directly contacting the metal oxide layer. The metal oxide layer may include molybdenum oxide. A side of the metal oxide layer may be oriented at a first angle relative to the face of the first base. A side of the conductive metal layer may be oriented at a second angle relative to the face of the first base. A size of the second angle may be in a range of 30&#xb0; to 75&#xb0;.

Wiring substrate and display device including wiring substrate

A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive layer and a metal oxide layer stacked on the conductive layer, wherein the metal oxide layer comprises molybdenum (Mo), tantalum (Ta), and oxygen (O). The conductive layer includes a first metal layer on the first base, and a second metal layer between the first metal layer and the metal oxide layer. The second metal layer has a higher electrical conductivity than the first metal layer, and a thickness of the second metal layer is greater than a thickness of the first metal layer.

Wire substrate and display device including the same

A display device may include a base and a first wiring layer disposed on the base. The first wiring layer may include a first material and a second material layer that overlap each other. A material of the second material layer may be different from a material of the first material layer. The second material layer contains MoO, wherein 1.9&#x2264;x&#x2264;2.1.

Wiring substrate, display device including the wiring substrate, and method of fabricating the wiring substrate

There is provided a display device. The display device includes a first substrate, a second substrate that faces the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. One of the first substrate and the second substrate includes a base substrate and a light blocking pattern disposed on a surface that faces the other surface of both surfaces of the base substrate, the light blocking pattern exposing a part of the base substrate. The light blocking pattern includes a semi-transmission reflective layer a disposed on the base substrate, a phase matching layer disposed on the semi-transmission reflective layer, and a reflective metal layer disposed on the phase matching layer. The phase matching layer and the reflective metal layer include materials having substantially the same etching rate.

Substrate, display device including the same, and method of manufacturing the display device

A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive metal layer and a metal oxide layer stacked on one another, wherein the metal oxide layer comprises MoTaO, wherein a content of tantalum is equal to or less than 2.0 at % (atomic percent) based on a total number of metal atoms.

Wire substrate, display device including the same, and method of fabricating wire substrate

A touch panel includes: a substrate which has sensing and peripheral areas; first sensing electrodes located on a surface of the substrate and arranged along a first direction in the sensing area and second sensing electrodes arranged along a second direction intersecting the first direction; a first connector located on the surface of the substrate and connecting the first sensing electrodes along the first direction; an insulating layer pattern located on the first connector; a second connector located on the insulating layer pattern, intersecting the first connector to be insulated from the first connector, and connecting the second sensing electrodes along the second direction; wiring lines located on the surface of the substrate, located in the peripheral area, and electrically connected to the first sensing electrodes or the second sensing electrodes; and a conductive pattern located between each of the second sensing electrodes and the second connector.

Touch panel and method of manufacturing the same

Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a second glycol based compound having a formaldehyde content of 0 ppm.

Method for manufacturing high purity glycol based compound

A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate having a touch area and a peripheral area that surrounds the touch area and a plurality of first touch electrode patterns that are formed in the touch area, extend in a first direction, and are configured to transmit a first touch signal. The touch panel also includes a plurality of second touch electrode patterns that are formed in the touch area, extend in a second direction crossing the first direction, and are configured to transmit a second touch signal and a plurality of first driving circuit wirings that are formed in the peripheral area and are respectively electrically connected to the first touch electrode patterns. The first driving circuit wirings include a low resistance wiring layer.

Touch screen panel including touch electrode patterns and driving circuit wirings having a low resistance wiring layer and connected thereto and manufacturing method thereof

A multi-output power supply apparatus may include a transformer unit transforming a voltage level of input power using a primary winding and first and second secondary windings, a first output unit stabilizing power applied to the first secondary winding using a voltage multiplier circuit and outputting first power, and a second output unit stabilizing power applied to the second secondary winding and outputting second power.

Multi-output power supply apparatus and output circuit thereof

The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Display device and manufacturing method thereof

Growing community of inventors

Suwon-si, South Korea

Hong Sick Park