Samsung Display Devices Co., Ltd.

Hong-kyu Choi

Jae-Myung Kim

Ki-Jun Kim

Hwan-chul Rho

Hyun-jin Kim

A method for forming a black matrix includes forming a black matrix applying a photoresist forming composition containing a compound represented by the formula (1) on the inner surface of a panel and drying the same to form a photoresist layer; exposing the photoresist layer; applying a black pigment solution for forming a black matrix on the photoresist layer and drying the same to form a black pigment layer; and developing the resultant structure; ##STR1## wherein, X is a halogen atom and l:m:n is 1.0-4.5:70.0-98.0:1.0-20.0. The method for forming a black matrix is a non-etching method, which is a simplified process and is not detrimental to environment. Also, since the black matrix material can be recovered from a developing solution for recycling, it is economical. Also, since the photoresist forming composition of the present invention has a good photosensitivity, a black matrix having an excellent landing margin can be obtained. Also, blackness of the black matrix pattern can be improved by using a Ti-containing black pigment as the black matrix forming composition.

Method for forming black matrix

A method of exposing a photosensitive layer or a fluorescent slurry layer deposited on the inner surface of a panel in which a shadow mask frame assembly is installed and apparatus therefor, are provided. A shadow mask installed inside the panel is induction-heated to a predetermined temperature using an induction-heating coil to be sufficiently expanded, and then the photosensitive layer or the fluorescent slurry layer deposited inside the panel is exposed via electron beam passing holes formed in the shadow mask. Therefore, the initial stabilization time for the CRT can be shortened.

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Suwon, South Korea

Hong-kyu Choi