Minuta Technology Co., Ltd.

Snu Rdb Foundation

Hong Hie Lee

Dahl Young Khang

Tae Wan Kim

Kookheon Char

Pil Jin Yoo

Kahp-Yang Suh

Hyunsik Yoon

Youn Sang Kim

The present invention relates to an optical film comprising a substrate on which an array of structures is formed, wherein a material having a different refractive index, absorbancy or reflectivity from that of a surface of the structures is partially coated on the surface of the structures, and a manufacturing method thereof. Specifically, the optical film according to one embodiment of the present invention may have a different transparency depending on the direction or can transmit light asymmetrically. Further, the optical film may be applicable to image devices, which need to change brightness or images depending on the angle of view or to display three-dimensional images.

Optical film with partially coated structure array and manufacturing method thereof

A mold for use in forming a target patterning on a substrate by using a pattern formed at one side of the mold is made of amorphous fluorine resin. The mold is fabricated through a compression molding technique by using a master mold () with a pattern structure thereon facing the pattern.

Mold made of amorphous fluorine resin and fabrication method thereof

In a method for forming a micro-pattern on a substrate ( ), polymer material having a solvent is coated on the substrate, thereby forming a polymer film on the substrate. Then, a mold ( ) having a predetermined shape is compressed into the polymer film ( ) on the substrate by employing a predetermined compression technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film. This compression procedure is performed at a room temperature, e.g., of about 10 to about 30&deg; C. In the present invention, before the mold ( ) is pressed into the polymer film ( ), a free volume in the polymer film is previously increased so that a pressure applied on the polymer material needed to plastically deform the polymer film is reduced. Thereafter, etching is performed on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate.

Method for forming a micro-pattern on a substrate

A mask pattern is formed on a substrate by using a solvent absorbent mold having a pattern structure with a relief and an intaglio portion. A mask layer dissolved in a solvent to obtain fluidity is prepared on the substrate. The mold is pressed onto the mask layer with a predetermined pressure, and a portion of the mask layer that contacts with the relief portion of the mold is introduced into the intaglio portion thereof. Then, the mold absorbs the solvent contained in the mask layer to thereby solidify the mask layer. Next, the mold is separated from the substrate and the portion of the mask layer that contacts with the relief portion of the mold is removed, thus finally obtaining the desired minute mask pattern.

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Seoul, South Korea

Hong Hie Lee