Cymer, Inc.

Holzer K Glatzel

William N Partlo

Richard L Sandstrom

Peter Clarke Newman

John T Melchior

William G Hulburd

Raymond F Cybulski

James K Howey

Alex P Ivaschenko

An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5 mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element to minimize thermal distortions in the LNP. This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter is provided with a special purge of a compartment exposed to the output laser beam.

Gas discharge laser with improved beam path

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San Diego, CA, United States of America

Holzer K Glatzel