Carl Zeiss Microscopy Gmbh

Other

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Carl Zeiss Nts Gmbh

Holger Doemer

Emmerich Bertagnolli

Andreas Schmaunz

Wolfram Buehler

Heinz Wanzenboeck

Stefan Martens

Walter Mack

Daniel Fischer

Carl Kuebler

Gottfried Hochleitner

Bernd Stenke

Ulrich Spittler-Herrmann

Peter Roediger

Volker Himmelsbach

Joerg Stodolka

Sebastian Alscher

Ruediger Rosenkranz

Matthias Lang

A method is carried out with the aid of a particle beam microscope which includes a particle beam column for producing a beam of charged particles, the particle beam column having an optical axis. Furthermore, the particle beam microscope includes a holding device for holding the extracted micro-sample. The method includes holding the extracted micro-sample and an adjacent hinge element via the holding device. The micro-sample adopts a first spatial orientation relative to the optical axis. The method also includes producing a bending edge in the hinge element by way of irradiation with a beam of charged particles such that the adjacent micro-sample is moved in space and the spatial orientation of the micro-sample is altered. The method further includes holding the micro-sample in a second spatial orientation relative to the optical axis, wherein the second spatial orientation differs from the first spatial orientation.

Method for changing the spatial orientation of a micro-sample in a microscope system, and computer program product

A method relates to the in situ preparation of a microscopic specimen is carried out using a particle beam device, which includes a particle beam column for producing a focused beam of charged particles, a specimen receptacle for receiving a specimen block, and a detector for detecting interaction products of the interaction between particle beam and specimen material. The method includes: providing a specimen block having an exposed structure that comprises a specimen region of interest; producing a bending edge in the exposed structure by the action of the particle beam such that at least some of the exposed structure is shaped in the direction of the incident particle beam; and moving the specimen receptacle, in which the specimen block is received, so that a specimen region, which is enclosed by the shaped structure, is observable and/or processable in the particle beam device.

Method for the in situ preparation of microscopic specimens

The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.

Method for measuring a distance of a component from an object and for setting a position of a component in a particle beam device

A processing system for micro processing. The processing system comprises a laser configured to generate a laser beam for performing laser processing within a preparation chamber. The processing system further comprises a transmission window, configured such that the laser beam enters into the preparation chamber through the transmission window. The processing system further comprises a fastening flange for fixing the transmission window relative to the preparation chamber, and a laser shield configured to provide, in a first arrangement of the laser shield, glare protection from a passage of the laser beam from a laser beam housing to the preparation chamber. The laser shield is movably mounted for movement between the first arrangement and a second arrangement of the laser shield, wherein in the second arrangement, at least one of the transmission window and the fastening flange is separable from the processing system.

Laser processing system having a laser shield and a transmission window

A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Method of depositing protective structures

A processing system includes a common base, an object mount configured to hold an object for inspection or processing, and at least one aperture plate provided on the object mount. The aperture plate has at least one aperture The processing system also includes a laser device mounted on the common base and configured to scan a laser beam across a scan region, and a transport device configured to displace the object mount relative to the common base from a first position to a second position. When the object mount is in the first position, the object and the at least one aperture are positioned within the scan region of the laser device. The processing system also includes at least one light guide provided on the object mount. The light guide has an input port provided by the at least one aperture, and an output port. The processing system also includes at least one light detector mounted at a fixed position relative to the common base and configured to detect light emerging from the output port of the light guide.

Laser processing system, object mount and laser processing method

A method includes using a scanner to scan a laser beam along a scan path, and detecting light intensities caused by laser light of the laser beam incident on a detection cross-section. The method also includes determining a position of the detection cross-section relative to the laser scanner based on the detected light intensities. The scan path includes, in a plane which includes the detection cross-section, a first partial path and a second partial path which extend adjacent to each other and at a distance from each other which is: a) smaller than a diameter of the detection cross-section plus a diameter of the laser beam in the plane which includes the detection cross-section; and b) greater than 0.3 times the diameter of the laser beam in the plane which includes the detection cross-section or greater than 0.3 times the diameter of the detection cross-section.

Method for operating a laser scanner and processing system with laser scanner

A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

Processing system

A particle beam systemfor cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply systemto supply a precursor gas to the interior of the vacuum chamberof the particle beam system. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.

Growing community of inventors

Bopfingen, Germany

Holger Doemer