Samsung Electronics Co., Ltd.

Hochul Ji

Jinyoung Kim

Beomsuk Lee

Kwansik Cho

Dongchul Lee

An image sensor includes a semiconductor substrate having a first surface and a second surface. The first surface includes an element isolation trench. An element isolation layer is arranged inside the element isolation trench. The element isolation layer defines an active region. A gate electrode is arranged on the first surface of the semiconductor substrate. An interlayer insulating layer is arranged on the first surface of the semiconductor substrate and covers the gate electrode. A ground contact is configured to penetrate the element isolation layer and the interlayer insulating layer and contacts the semiconductor substrate. A color filter is arranged on the second surface of the semiconductor substrate.

Growing community of inventors

Seongnam-si, South Korea

Hochul Ji