E.i. Dupont De Nemours and Company

Du Pont China Limited

Dupont Electronics, Inc.

Hoang Vi Tran

Hee Hyun Lee

William Brown Farnham

Michael T Sheehan

Michael Stephen Wolfe

Andrew Edward Feiring

Michael Fryd

Frank L Schadt, Iii

John Donald Summers

Brian Douglas Mather

Fredrick Claus Zumsteg, Jr

Bryan Benedict Sauer

Michael Karl Crawford

Yuefei Tao

Edmund Francis Schieffer, Jr

Esther Kim

Daqing Zhang

Ma Helen Cativo

Kenneth C Keup

Michael Thomas Sheehan

Charles Ray Chambers Jr

This invention provides a polymer thick film electrically conductive paste composition, comprising conductive metal powder, a resin blend of polyol and phenoxy resin, blocked aliphatic polyisocyanate and one or more polar, aprotic solvents. In one embodiment the paste composition is used to form electrically conductive adhesive. In another embodiment the paste composition is used to form an electrically conductive polymer thick film.

Flexible electrically conductive pastes and devices made therewith

The present invention provides a thick-film paste composition for printing the front side of a solar cell device having one or more insulating layers. The thick-film paste comprises an electrically conductive metal and an oxide composition dispersed in an organic medium that includes microgel particles and an organopolysiloxane.

Conductive paste composition and semiconductor devices made therewith

A conductive paste composition comprises (i) an inorganic powder comprising at least a conductive powder, (ii) at least one microgel polymer, and (iii) a solvent. The paste composition may be used in a process for manufacturing an electrical device comprising: preparing a substrate; applying the conductive paste onto the substrate in a preselected pattern; and heating the applied conductive paste to form a conductive structure that provides an electrode for connecting the device. The paste composition beneficially permits the formation of narrow, high aspect ratio features in the conductive structure.

In a first aspect, a composition of matter includes a substantially symmetrical 3-arm star block copolymer having a central core and diblock copolymer arms having inner blocks and outer blocks. In a second aspect, an article includes a substrate, a block copolymer composition on the substrate, and a neutral layer between the substrate and the block copolymer composition.

Substantially symmetrical 3-arm star block copolymers

This invention relates to the preparation and purification of high-X ('chi') diblock copolymers. Such copolymers contain two segments ('blocks') of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.

Preparation, purification and use of high-X diblock copolymers

A process for sealing a multilayer article against environmental degradation. The article comprises a photoactive layer disposed on a length of flexible substrate and is sealed by applying a sol-gel layer to the outermost layer of the article and curing the sol-gel layer into a flexible, glass protective-coating. The multilayer article can be a photovoltaic device.

Moisture barrier for photovoltaic cells

The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers

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Wilmington, DE, United States of America

Hoang Vi Tran