Samsung Electronics Co., Ltd.

Seoul National University

Korea Institute of Science and Technology

Snu Rdb Foundation

Samyoung Pure Chemicals Co., Ltd.

Wisconsin Alumni Research Foundation

Semes Co., Ltd.

Ho-Young Kim

Soo-Jung Ryu

Woong Seo

Moo-Kyoung Chung

Young-chul Cho

Hoon Hee Han

Junhee Choi

Jung-bae Lee

Jae Hong Lee

Won-Jun Lee

Seong-Hoon Jeong

Jae-Hyuck Choi

Myoung-Woon Moon

Hyung-ho Ko

Chan-Uk Jeon

Young-rae Park

Won-Jung Kim

Jong-Keun Oh

Jin-Hye Bae

Jung-Ig Jeon

Chang-Kyu Lee

Geun-Joo Baek

Keun-Hwan Park

Sungjin Kim

Kyung Ho Kim

Sunghwan Kim

Dongwook Kim

Dae-Young Lee

Seo Young Kim

Min Hee Lee

Young Il Kim

Ho-Cheol Lee

Dong-Hoon Yoo

Dong-Min Kang

Heon Ju Lee

Kwang Ho Kim

Jin-Seok Lee

Jae-Dong Lee

Yeon-Gon Cho

Do Hyun Kim

Seok Heo

Kyu Hwan Oh

Chang-Ki Hong

Tae-Hong Kim

Gui Su Park

Kwang Ryeol Lee

Yong-Sub Kim

Tae Jun Ko

Soon Cheol Kweon

Sung-Bae Park

Hee-jun Shim

Woo-Pyo Jeong

Hyungmin Park

Jeong-Wook Kim

Yoon Pyo Lee

Junyoung Lee

Buyoung Jung

O Chang Kwon

Dae Wook Park

Seungtae Yang

Young-taek Hong

Nam-Sung Kim

Hong-kyu Hwang

Hyo-Sun Lee

Seung-Hun Jin

Jeong-heon Park

Jaekyung Park

Chang-Moo Kim

Sung-bae Kim

Shin Hye Chung

Dohyun Jung

Won Jun Shon

Seung Kyung Park

Beom June Shin

Changho Yun

Chaehung Lim

Dongjo Kim

Myung-Seob Song

Sun-min Kwon

Daniel W Chang

Hong-kwon Youn

Bong Su Shin

Yunsuk Jeung

Yong-sub Kim

Tae-Gon Cha

In a method of coating a photoresist, the photoresist may be provided to an upper surface of a rotating wafer. A hovering solution may be injected to an edge portion of the photoresist under a condition that the hovering solution may be hovered with respect to the edge portion of the photoresist with an air layer being interposed between the hovering solution and the edge portion of the photoresist to limit and/or prevent a bead of the photoresist from being formed on an edge portion of the upper surface of the wafer. Thus, the photoresist having a uniform thickness may be coated on the upper surface of the wafer to improve a yield of a semiconductor device by increasing an effective area of the edge portion of the wafer.

Method of coating a photoresist and apparatus for performing the same

The present invention relates to a root canal treatment apparatus for cleaning a root canal, a root canal treatment apparatus for charging a root canal, or a root canal treatment apparatus for cleaning and charging a root canal. The root canal treatment apparatus for cleaning a root canal according to the present invention comprises: a storage container for storing a cleaning liquid or a filler supplied from the outside; an ultrasonic oscillator for applying ultrasonic waves to the cleaning liquid or the filler stored in the storage container; an injection port for injecting, around the root canal, the cleaning liquid or the filler to which the ultrasonic waves have been applied in the storage container; and a nozzle having a suction port for sucking the cleaning liquid or bubbles in the root canal or the bubble.

Root canal treatment apparatus

A method for treating a substrate is provided. The method includes supplying a first treating liquid to a treating target surface of the substrate while the substrate is rotating, and subsequently, supplying a second treating liquid having a surface tension lower than a surface tension of the first treating liquid to the substrate while an evaporation inhibiting agent in a vapor state is present around the first treating liquid supplied to the substrate, such that the first treating liquid on the substrate is substituted with the second treating liquid. Thus, a vapor atmosphere may be formed around a cleaning liquid applied to the substrate. Thus, a liquid-film destroying phenomenon may be prevented in a procedure in which the cleaning liquid is replaced with an organic solvent.

Substrate treating method and substrate treating apparatus

A swizzle pattern generator is provided to reduce an overhead due to execution of a swizzle instruction in vector processing. The swizzle pattern generator is configured to provide swizzle patterns with respect to data sets of at least one vector register or vector processing unit. The swizzle pattern generator may be reconfigurable to generate various swizzle patterns for different vector operations.

Processing device and a swizzle pattern generator

A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

Composition for cleaning magnetic patterns

Provided are a method of generating a functional coverage model from a hardware description language (HDL) code for a circuit design and performing verification of the circuit design by using the functional coverage model, and a computing system in which the method is performed.

Computing system and method of performing verification of circuit design in the computing system

The present disclosure relates to a ski wax composition including superhydrophobic carbon nano particles (CNPs) and a preparation method thereof, and more particularly, to a ski wax composition including a wax and superhydrophobic CNPs and a preparation method thereof. According to the present invention, since the hydrophobicity and retention capacity of the wax can be increased, friction reducing performance of a ski wax can be increased on an ice surface or a snow surface. In addition, since the superhydrophobic CNPs, which can be easily prepared, are used, the productivity of the ski wax composition can be improved and superb friction reducing performance can be exhibited. Further, since the superhydrophobic CNPs are dispersed into the wax by a simple sonication process, a problem caused by adding a surfactant can be solved. Therefore, the ski wax composition according to the present disclosure can be widely applied to industrial fields associated with the winter sports, including skiing.

High performance ski wax composition and preparation method thereof

A washing machine includes a tub; a drum rotatably disposed inside the tub; and an ultrasound generator configured to emit ultrasonic waves to washing water loaded in the drum, and to generate bubbles. The ultrasound generator applies ultrasonic energy to the washing water to cause chaotic oscillation of the bubbles.

Washing machine

Provided are a texture compressing method and a texture compressing apparatus, which compress some color information of a texture block, which is unable to realize all colors included in the texture block by a determined compression bit number, to be stored in a compression data bit of a texture block, which is able to realize all colors included in the texture block by a bit number lower than the determined compression bit number, based on a color distribution of each texture block, and a texture decompressing method and a texture decompressing apparatus corresponding to the texture compressing method and the texture compressing apparatus.

Texture compressing method and apparatus and texture decompressing method and apparatus

An oil-collecting apparatus includes: a body including an inlet through which a liquid is introduced, a first outlet through which purified water generated from the liquid introduced through the inlet is discharged, and a second outlet through which materials collected from the liquid are discharged; and a filter arranged at the first outlet of the body and generating the purified water by collecting the materials included in the liquid by allowing the liquid introduced through the inlet to pass therethrough.

Oil collecting apparatus and oil collecting system having the same

Method of forming magnetic patterns, and method of manufacturing magnetic memory devices

A method and apparatus for generating a test bench for verifying a processor decoder are provided. The method including receiving an architecture description comprising processor decoder information, parsing the received architecture description into information for verifying the processor decoder, and generating the test bench to verify the processor decoder based on the parsed information.

Method and apparatus for generating test bench for verification of processor decoder

An apparatus and method for forming a three-dimensional (3D) pattern using electrojetting, the apparatus including: a syringe tip having one end from which a polymer jet is discharged; a substrate that is disposed in a direction in which the polymer jet is discharged, and that forms an electric field between the substrate and the syringe tip; and a movement unit that moves the syringe tip or the substrate, wherein the polymer jet discharged from the syringe tip is moved relative to an upper side of the substrate and is stacked on the substrate.

Apparatus and method for forming three-dimensional pattern using electrojetting

A method for adjusting bandwidth, a bandwidth scaler and an apparatus are provided. The method for adjusting bandwidth involves determining a dynamic context of a processor, and based on the determined dynamic context, scaling bandwidth between the processor and a memory.

Apparatus and method for adjusting bandwidth

Growing community of inventors

Seoul, South Korea

Ho-Young Kim