Samsung Electronics Co., Ltd.

Ho Seok Choi

Sang Don Jang

Dong Seok Baek

Sang Hyun Park

Sung Min Ahn

Hi Kuk Lee

Jung Hyeon Kim

Sang Joon Hong

Oui Serg Kim

Mi Jeong Song

Duke Kimm

Sergey Antonov

In Bae Jang

Jeong Su Ha

Sang Geun Park

Sang-il Hong

Myung Ho Kim

Vasily Lenyashine

Hyeong Min Ahn

Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.

Maskless exposure apparatus having measurement optical unit to measure depths of focus of a plurality of beams and control method thereof

Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.

Maskless exposure apparatus and method of alignment for overlay in maskless exposure

According to an example embodiment, a position arrangement device includes at least one joint module between a first base and a second base. The at least one joint module is configured to adjust a position of the second base relative to the first base based on elastic flexion in the joint module.

Position arrangement device and joint module thereof

A method to compress exposure data may include converting image data into a plurality of exposure data, generating new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and compressing the new exposure data. An exposure apparatus may include a conversion unit that converts image data into a plurality of exposure data, a control unit that generates new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and a compression unit that compresses the new exposure data.

Exposure apparatuses and methods to compress exposure data

A TFT array inspecting apparatus inspects a TFT array disposed at either an inclined position and a level position. The TFT array inspecting apparatus includes a vacuum chamber, a stage disposed in the vacuum chamber so that a TFT array to be inspected is disposed on the stage, an electron gun disposed opposite to the stage in the vacuum chamber to generate an electron beam onto the TFT array, an electron detecting unit to detect secondary electrons emitted from the TFT array by the electron gun, and at least one elevating unit to move the TFT array move between a level position and an inclined position having a designated angle with the level position.

TFT array inspecting apparatus

Growing community of inventors

Suwon-si, South Korea

Ho Seok Choi