Samsung Electronics Co., Ltd.

Posco

Ho Jun Yu

Minseok Choi

Jeonggil Kim

Sunghyup Kim

Byeong Sang Kim

Ki Ju Sohn

Kyung Bin Park

Dong Wook Kim

Dong-wook Kim

Inho Choi

Sung-Ho Jang

Kwang Chan Lee

Jung Wook Kim

Jongbin Park

Min-Seok Choi

Jinhwan Lee

Jeong Kwang Lee

Chae-mook Lim

Ju-hyun Lee

Ju Hyun Lee

Byeong-sang Kim

Eun Soo Hwang

Ki-ju Sohn

Kyung-Lyong Han

Il-Seop Choi

Kyung-bin Park

A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

Target debris collection device and extreme ultraviolet light source apparatus including the same

An extreme ultraviolet (EUV) light concentrating apparatus including a main body having a concave inner portion and configured to rotate, a tin generator configured to generate tin drops and spray the tin drops, a tin catcher configured to process the sprayed tin drops, a protective cover configured to block the tin drops from falling into the main body, and a rotation guide configured to rotate the main body may be provided.

EUV light concentrating apparatus and lithography apparatus including the same

A semiconductor device includes a clock generator which receives an input clock and generates an output clock, a reference voltage generator which receives the input clock or the output clock, generates a sub-reference voltage in accordance with a frequency of the input clock or a frequency of the output clock, and generates a reference voltage using the sub-reference voltage and a preset error voltage, and a clock detector which receives the output clock, generates a first output voltage in accordance with the output clock, and compares the generated first output voltage with the reference voltage to output an error signal based on the output clock, wherein the preset error voltage is set in accordance with a degree of preset error of the output clock.

Semiconductor device and clock detector

An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200&#xb0; C. to 800&#xb0; C.

Apparatus for removing residues from source vessel

An imprinting apparatus includes a first frame, a pressure roller rotatably supported on a first end of the first frame, a second frame including a support portion coupled to a second end of the first frame, and at least one guide portion coupled to the support portion to be laterally movable, and at least one load roller supported by the at least one guide portion, the at least one load roller being movable in a vertical direction while being rotatable and contacting a surface of the pressure roller on an upper portion of the pressure roller according to a lateral movement of the guide portion, the at least one load roller to press the pressure roller by force exerted by a load of the at least one load roller.

Imprinting apparatus

A film frame, a system for manufacturing a display substrate, and a method of manufacturing a display substrate, the film frame including a pair of frame edges extending lengthwise in a first direction and arranged opposite to each other; a fixed end clamp connected to the pair of frame edges and extending lengthwise in a second direction perpendicular to the first direction; and a free end clamp between the pair of frame edges, the free end clamp extending lengthwise in the second direction and configured to be detachably coupled with the pair of frame edges, wherein the fixed end clamp includes a first magnetic fixer extending lengthwise in the second direction and a second magnetic fixer on the first magnetic fixer, and the free end clamp includes a third magnetic fixer extending lengthwise in the second direction and a fourth magnetic fixer on the third magnetic fixer.

Film frame, display substrate-manufacturing system, and display substrate-manufacturing method

An ultraviolet curing apparatus includes a housing, a plurality of ultraviolet light emitting diodes (LEDs) arranged in a length direction of the housing, and at least one shutter part coupled to the housing to be movable in the length direction, to cover at least a portion of the plurality of ultraviolet LEDs to limit an irradiation region of ultraviolet light emitted by the plurality of ultraviolet LEDs.

Ultraviolet curing apparatus

There is provided a wearable robot able to maintain a balanced state during operations thereof. The wearable robot includes: a wearable robot body; a travel unit for moving the wearable robot body; and a hip joint unit provided in the wearable robot body and coupled to the travel unit, for maintaining a posture of the wearable robot body in response to a movement of the travel unit. With this construction, the wearable robot is provided with a hip joint unit having a resilient force such that a posture of a wearable robot body can be maintained during an operation of the hip joint unit, so that the robot can be operated more stably. Further, because a posture of the wearable robot can be stably maintained so that the safety of the user can be guaranteed and operation efficiency can be improved.

Wearable robot

Growing community of inventors

Seoul, South Korea

Ho Jun Yu