Korea Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Ho Joong Jung

Sang Wook Han

Young Wook Cho

Sung Wook Moon

Yong Su Kim

Hansuek Lee

Hyung Jun Heo

Hyeon Hwang

Hyang Tag Lim

Min Kyo Seo

Seung Woo Jeon

The present invention relates to a method for etching lithium niobate, the method including a process of etching lithium niobate using a mask pattern as a physical dry etching method using Ar plasma produced in a chamber through Ar gas, wherein in the process of etching lithium niobate, a process pressure of the chamber is maintained at 1 mTorr to 20 mTorr, and a method for forming a lithium niobate pattern using the same.

Method for etching lithium niobate and method for forming lithium niobate pattern using the same

An inverted nanocone structure of the present disclosure includes a first surface, a second surface spaced apart from the first surface by a predetermined distance and having a greater area than the first surface, and a body having an inverted cone shape between the first surface and the second surface, wherein at least one activated point defect center is provided in the body.

Inverted nanocone structure for optical device and method of producing the same

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Seoul, South Korea

Ho Joong Jung