Lg Chem, Ltd

Ho Chan Ji

Han Soo Kim

Yoon Hee Heo

Kyung Soo Choi

Geun Young Cha

Sung-Hyun Kim

Min Young Lim

Dongchang Choi

Sun Hwa Kim

Dong Chang Choi

Sang Chul Lee

Sung Hyun Kim

Sunhwa Kim

Changho Cho

Sunghyun Kim

Won Jin Chung

Ji Heum Yoo

The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process.

Photosensitive resin composition and photosensitive material comprising the same

The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

Polymer and photosensitive resin composition comprising the same

A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159&#xb0; C., 55-90 weight % of a second solvent having a boiling point of 160-200&#xb0; C., and 3-15 weight % of a third solvent having a boiling point of 201-280&#xb0; C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.

Photosensitive resin composition for black matrix

Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.

Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same

Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.

Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer

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Daejeon, South Korea

Ho Chan Ji