Seiko Epson Corporation

Hitoya Nagasawa

Masahiro Yasukawa

Kenya Ishii

Provided are an electro-optical device and an electronic apparatus enabling a channel length of a transistor provided in a peripheral circuit to be set to an appropriate dimension even when a region available for disposing the peripheral circuit has a reduced width. A plurality of N-channel type transistors formed in a scan line drive circuit of an electro-optical device each include a light-shielding layer, an insulating layer, a semiconductor layer, a gate insulating layer, and a gate electrode laminated one on another in order on the one surface side of a first substrate, and a slit overlapping a channel region in planer view extends in a channel width direction to the light-shielding layer. Therefore, in the semiconductor layer, step part reflecting a shape of each of end portions of the light-shielding layer via the insulating layer extend in the channel width direction in the channel region.

Electro-optical device and electronic apparatus

An electro-optical device (e.g., a liquid crystal device) includes a data line connected to a switching element provided for each pixel, a sampling transistor that has a gate supplied with a selection signal, a source supplied with an image signal, and a drain connected to the data line, and a monitoring transistor. A gate of the monitoring transistor is supplied with an input signal. A delay signal indicating a delay amount of the selection signal is sent out from a drain of the monitoring transistor. The sampling transistor includes a plurality of transistors connected in parallel to each other along the data line. The monitoring transistor includes one transistor along the data line.

Electro-optical device and electronic apparatus with sampling and monitoring transistors

In a liquid crystal device, in an element substrate, a first area, a second area, and a third area are provided in an area overlapped with sealing material which bonds the element substrate and a counter substrate. In addition, a film which is in the same layer as a first pixel electrode is provided in all of the first area, the second area, and the third area. In addition, a plurality of second pixel electrodes which are in the same layer as the first pixel electrode are formed in a area overlapped with the seal material.

Liquid crystal device and electronic apparatus

In an electro-optical device, a first transistor includes a first gate electrode electrically connected to a scanning line via a first contact hole in an insulating film. A second transistor includes a second gate electrode electrically connected to the scanning line via a second contact hold in the insulating film. A planar size of the first contact hole is different from a planar size of the second contact hole.

In a display pixel of an element substrate of an electro-optical device, a first gate electrode of a first transistor is electrically connected to a scanning line via a first contact hole of an insulating film. In a dummy pixel, a light blocking layer of the same layer as the scanning line is formed, and a second gate electrode of a second transistor is electrically connected to a scanning line via a second contact hole. A gap between the end portion of the second contact hole and the end portion of the scanning line is wider than the gap between the end portion of the first contact hole and the end portion of the scanning line.

A liquid crystal device includes a positive potential connection line as a first connection line layer to which a first potential lower than a common potential is applied, between a pixel area and a seal member in the plan view, and a peripheral electrode as a second connection line layer that is provided between the positive potential connection line and a liquid crystal layer, is provided to overlap with at least a part of the positive potential connection line in the plan view, and to which a second potential higher than the common potential is applied.

An electro-optic device includes: A frame light-shielding film defined a periphery of a pixel area. A frame light-shielding film having an opening at a predetermined position. An alignment mark formed in the opening. An opening light-shielding film formed so as to shield the opening in plan view.

Electro-optic device, and electronic apparatus including the same

An electro-optical device includes a contact hole with a channel-region adjacent portion next to the channel region of the semiconductor film and a first extending portion that extends from the channel-region adjacent portion along the first partial region of the semiconductor film when viewed in plan.

An electro-optical device includes a plurality of pixel electrodes, storage capacitors which are provided below the plurality of pixel electrodes with an inter-layer insulating layer disposed therebetween and in which a lower electrode, a dielectric film, and an upper electrode are sequentially laminated, an extending section extending from the dielectric film, a first conductive film disposed above the extending section of the dielectric film, a second conductive film disposed below the extending section of the dielectric film, and a relay layer disposed above the first conductive film, formed of the same film as the plurality of the pixel electrodes, and electrically connecting the first conductive film to the second conductive film, wherein the plurality of pixel electrodes and the storage capacitors are provided in a pixel area on a substrate, and the extending section, the first conductive film, the second conductive film, and the relay layer are disposed in a peripheral area located around the pixel area.

Electro-optical device, manufacturing method thereof, and electronic apparatus

An electro-optical device includes a substrate, a plurality of scanning lines, a plurality of data lines intersecting with the corresponding plurality of scanning lines in pixel areas on the substrate, a plurality of pixels arranged in the pixel areas so as to correspond to intersections of the plurality of scanning lines and the plurality of data lines, hold capacitors each arranged for a corresponding one of the data lines, and N image signal lines for supplying N image signals which have been subjected to serial-parallel conversion to the plurality of data lines divided into data line groups, each of which has N data lines of the plurality of data lines, where N is a natural number not less than 2. Of the hold capacitors, capacitance values of first hold capacitors arranged for data lines at the ends of each of the data line groups having the N data lines and capacitance values of second hold capacitors arranged for corresponding data lines other than the data lines at the ends of each of the data line groups having N data lines are different from each other.

An electro-optical device includes a plurality of pixels, a sampling circuit, electrostatic protection circuits, constant potential lines, and image signal lines. The electrostatic protection circuits switching elements having first terminals and second terminals. The first terminals are electrically connected to the second terminals when an over voltage is applied to the first terminals. The constant potential lines are connected to the second terminals of the switching elements via contact holes of the first insulating layer. The image signal lines transmit image signals supplied to input terminals to the sampling circuit. The image signal lines include first wiring line portions connected to the first terminals of the switching elements via the contact holes of the first insulating layer, and a second wiring line portion connected to the first wiring line portion via contact holes of the second insulating layer.

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Matsumoto, Japan

Hitoya Nagasawa