Nippon Oil Company

Dai Nippon Printing Co., Ltd.

Nippon Mitsubishi Oil Corporation

Hitoshi Yuasa

Yutaka Otsuki

Toru Nakamura

Haruyoshi Sato

Mitsuo Matsuno

Yukio Yamasita

Hirosuke Imai

Eiji Yoda

Tetsuo Satoh

Hiroyoshi Omika

Fumiaki Oshimi

Masami Enomoto

Norikatsu Ono

Masayuki Ando

Tadafumi Shindo

Susumu Kubota

Makoto Sasaki

Yoshihiro Kobori

Takafumi Ishii

Masanobu Suga

Hiroyuki Ozawa

Teruaki Yamanashi

Teruhisa Kuroki

Yukio Yamashita

Teraki Yamanashi

Acrylic copolymers derived from a monomer mixture containing a vinyl monomer having a benzotriazole skeleton which is high in ultraviolet absorptivity and wide in ultraviolet absorptive wavelength range, an acrylic ester and a methacrylic ester are useful for the preparation of a non-water-based coating composition forming a coating film having an ultraviolet shielding ability. Acrylic copolymers derived from the above monomer mixture further containing a vinyl monomer containing carboxyl groups are useful for the preparation of a water-based coating composition having an ultraviolet shielding ability.

Water-based coating composition

A method for producing a color filter involves (A) forming a photosensitive coating film on at least a transparent electrically conductive layer of a substrate having both the transparent electrically conductive layer and a light-intercepting layer on its outermost surface, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; and (B) developing and removing a photosensitive coating film portion exposed to light in one of smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being sequentially repeated for the respective irradiation amounts where the sequence of repetition is selected from the group consisting of increasing irradiation amount and decreasing irradiation amount to form different colored layers, respectively.

Method for producing a color filter with a photosensitive coating film

A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

Substrate having light shielding layer

A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming a light-irradiated region where a light irradiation amount is different in two steps; (c) developing a larger light-irradiated portion to lay-open the transparent electrically conductive layer followed by electrodepositing a light shielding layer thereon; (d) forming on the positive photosensitive coating film undeveloped in the step (c) a light-irradiated region where a light irradiation amount is different in two steps; (e) developing a larger light-irradiated portion of the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon; (f) forming on the positive photosensitive coating film undeveloped in the step (e) a light-irradiated region where a light irradiation amount is different in at least three steps; and (g) developing the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon, operation of the developing and electrodepositing being sequentially repeated at least twice in decreasing light irradiation amounts.

Method for producing color filter

A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.multidot.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

Method for forming a substrate having a light shielding layer

A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming on the photosensitive coating film a first region where a light irradiation amount is different in two steps; (c) developing a light-irradiated portion of the first region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (d) forming on the remaining photosensitive coating film a second region where a light irradiation amount is different in two steps; (e) developing a light-irradiated portion of the second region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (f) removing the remaining photosensitive coating film not developed in the steps (c) and (e); (g) forming a positive or negative photosensitive coating film on the transparent substrate; (h) forming on the photosensitive coating film formed in the step (g) a third region where a light irradiation amount is different in at least three steps; and (i) developing the third region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer, the operation of the developing and electrodepositing being sequentially repeated in the order of decreasing or increasing light irradiation amounts to thereby form different colored layers.

A method for producing a color filter comprising exposing a portion of the color filter corresponding to colored portions through a different pattern mask by colors and in an irradiation dose varying for each mask to effect patterning and successively coloring the pattern portions smaller or larger in the order of light irradiation dose by way of development and electrodeposition.

A novel hydroxyphenylated resin having excellent thermal stability, weather resistance, and electrical properties useful as a resin for a printed circuit board, a resin for sealing a semiconductor, an insulating materials, and the like; a process for preparing the resin; and curable epoxy composition comprising the same. Specifically, the present invention provides a novel resin containing a number of phenolic hydroxyl groups and having a high softening point and substantially no double bonds; and a process for preparing the same wherein a butadiene oligomer and a phenol compound are used as starting materials; and a curable epoxy resin composition comprising the same suitable for applications such as a sealing material.

Resin, process for preparing the same and compositon comprising the same

A positive photosensitive resin composition contains 50 to 95 parts by weight of a resin (a) composed of a high molecular compound (A) having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500 and containing carbon-carbon double bonds and a group represented by the formula (I) ##STR1## wherein R.sub.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and X denotes a hydrogen atom or a bond, on the proviso that if X denotes the bond, a carbon atom linked to R.sub.1 and a carbon atom linked to a hydrogen atom together form a portion of a main chain of the high molecular compound (A), and a group represented by the formula (II) ##STR2## wherein R.sub.1 and X denote the same as above, and R.sub.2 denotes an alkyl, cycloalkyl or aryl group, and 5 to 50 parts by weight of a compound (b) containing quinone diazide groups.

Positive photosensitive resin composition comprising a polymer having

A method for producing a color filter involves (A) forming a photosensitive coating film on at least a transparent electrically conductive layer of a first substrate having both the transparent electrically conductive layer and a light-intercepting layer on its surface or a second substrate having the transparent electrically conductive layer on its outermost surface and a light-intercepting layer between the second substrate and the transparent electrically conductive layer and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances, and (B) developing and removing a photosensitive coating film region corresponding to a pattern having smallest degree of light transmittance or a pattern having largest degree of light transmittance for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being sequentially repeated for the respective patterns having different degrees of light transmittances where the sequence of repetition is of increasing light transmittance or decreasing light transmittance.

An epoxy resin composition contains an epoxy resin represented by the formula (I) and a curing accelerator: ##STR1## wherein R.sup.1 stands for ##STR2## where G stands for a glycidyl group, R.sup.2 stands for an alkyl group having 1 to 4 carbon atoms, R.sup.3 and R.sup.4 stand for the same or different groups and each denote a hydrogen atom or a glycidyl group, m and x each denote an integer of 0 to 10, n denotes an integer of 0 to 2, provided that m.gtoreq.x and, if m=0, then x=0, in which case at least one of R.sup.3 and R.sup.4 denotes a glycidyl group on the condition that when m.gtoreq.1 and m&gt;x, R.sup.1 may each stand for different groups.

Composition of glycidylated phenol/vinylcyclohexene or vinylnorbornene

A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced ##STR1## wherein R.sup.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R.sup.2 denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group, The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.

Positive type photoresist composition comprising a polymer having

A method for producing a color filter involves the steps of: (A) forming a photosensitive coating film on an electrically conductive layer formed on a surface of a substrate, and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the electrically conductive layer, and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon; (C) repeating the step (B) for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively; and (D) transcribing the colored layers onto another substrate.

A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer of a transparent substrate having the transparent electrically conductive layer on its surface, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; and (B) developing and removing a photosensitive coating film portion exposed to light in one of the smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being sequentially repeated for the respective irradiation amounts where the sequence of repetition is selected from increasing irradiation amount and decreasing irradiation amount to form different colored layers, respectively.

A positive type photosensitive resin composition contains (a) a quinone diazido phenolic resin represented by the formula: ##STR1## wherein R.sup.1 is an alkyl group having 1 to 4 carbon atoms, R.sup.2 is a bivalent hydrocarbon residue having 5 to 16 carbon atoms provided that groups bound to R.sup.2 do not bind with the same carbon atom of R.sup.2, D.sup.1, D.sup.2 and D.sup.3 and are the same or different groups and each represent a hydrogen atom or a quinone diazido unit represented by ##STR2## provided that a molar ratio of the hydrogen atom to the quinone diazido unit is 0 to 10, m is a number of 0 to 10, n is a number of 1 or 2, and l.sub.1, l.sub.2 and l.sub.3 are the same or different numbers and each represent a number of 1 to 3; and (b) an alkali-soluble resin.

Growing community of inventors

Yokohama, Japan

Hitoshi Yuasa