Tokyo Ohka Kogyo Co., Ltd.

The University of Chicago

Tokyo Ohka Kogyo., Ltd.

Hitoshi Yamano

Ken Miyagi

Tasuku Matsumiya

Akiya Kawaue

Masahito Yahagi

Tsuyoshi Kurosawa

Takaya Maehashi

Takehiro Seshimo

Paul Franklin Nealey

Taku Hirayama

Katsumi Ohmori

Xuanxuan Chen

Daiju Shiono

Takahiro Kojima

Yasuhiro Yoshii

Yoichi Hori

Takahiro Dazai

Issei Suzuki

A resist composition including a resin component whose solubility in a developing solution is changed due to the action of the acid, in which the resin component has a constitutional unit derived from a compound represented by Formula (a0-1) and a constitutional unit containing an acid decomposable group whose polarity is increased due to the action of the acid. In the formula, W represents a polymerizable group-containing group, Yarepresents a carbon atom, Xarepresents a group that forms a monocyclic aliphatic hydrocarbon group together with Ya, some or all hydrogen atoms in the monocyclic aliphatic hydrocarbon group may be substituted with substituents, and Rarepresents an aromatic hydrocarbon group which may have a substituent. 

Resist composition and method of forming resist pattern

A resist composition including a resin component whose solubility in a developing solution is changed due to an action of an acid, in which the resin composition has a constitutional unit derived from a compound containing a chain-like aliphatic acid dissociable group or a monocyclic aliphatic acid dissociable group and a constitutional unit derived from a compound containing an aromatic hydrocarbon group-containing acid dissociable group.

A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer () containing a block copolymer on a substrate (); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer () to obtain a structure (') containing a phase-separated structure.

Method of producing structure containing phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance Ra(MPa) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1).4.1&#x2264;&#x2264;9&#x2003;&#x2003;(1)

Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition

A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.

Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being &#x2212;4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X&#x2033; represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y&#x2033; and Z&#x2033; each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R&#x2033; represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6. 

A brush composition used for phase-separation of a layer containing a block copolymer on a substrate, the brush composition including a resin component (N), the resin component (N) containing a hydrophobic structural unit (Nx) and a hydrophilic structural unit (Ny), the amount of the structural unit (Ny) within the resin component (N) being 5 mol % or less.

Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMA

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.

A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Rrepresents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5. 

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Kawasaki, Japan

Hitoshi Yamano