Otsuka Pharmaceutical Company, Limited

Hitoshi Nagao

Takumi Sumida

Tae Fukushima

Takeshi Kuroda

Tomoichi Shinohara

Kunio Oshima

Takahiro Tomoyasu

Takahito Yamauchi

Hironobu Ishiyama

Kazuhide Ohta

Chiharu Kitajima

Masaaki Takano

Satoshi Yamada

Takashi Suzuki

Takashi Nakagawa

Nobuaki Ito

Kuninori Tai

Makoto Sakamoto

Michinori Tanaka

Koichi Yasumura

Seiji Akamatsu

Keizo Kan

Yasuo Yanagihara

Noriaki Takemura

Yutaka Kojima

Keisuke Miyajima

Kazuhisa Sugiyama

Hideki Takasu

Takuya Shitsuta

Mitsuhiro Okuno

Naoto Ohi

Takeshi Kodama

Kunihiko Kiyono

Kenji Watanabe

Hironori Tsutsui

Shuji Matsumura

Hideaki Satou

The present invention provides a carbostyril compound represented by General Formula (1) or a salt thereof, wherein A is a direct bond, a lower alkylene group, or a lower alkylidene group; X is an oxygen atom or a sulfur atom; Rand Reach represent a hydrogen atom; the bond between the 3 and 4 positions of the carbostyril skeleton is a single bond or a double bond; Ris a hydrogen atom, etc; Ris a hydrogen atom, etc; and Ris a hydrogen atom, etc. The carbostyril compound or salt thereof of the present invention induces the production of TFF, and thus is usable for the treatment and/or prevention of disorders such as alimentary tract diseases, oral diseases, upper respiratory tract diseases, respiratory tract diseases, eye diseases, cancers, and wounds.

Carbostyril compound

The present invention provides a novel compound, which has an excellent effect of suppressing the generation of collagen and less side effects, with being excellent in terms of safety. The compound of the present invention is represented by the following general formula (1): [wherein Xrepresents a nitrogen atom or a group &#x2014;CH&#x2550;; Rrepresents a group &#x2014;Z&#x2014;R, wherein Z represents a group &#x2014;CO&#x2014;, a group &#x2014;CH(OH)&#x2014;, or the like, and Rrepresents a 5- to 15-membered monocyclic, dicyclic, or tricyclic, saturated or unsaturated heterocyclic group having 1 to 4 nitrogen atoms, oxygen atoms, or sulfur atoms; Rrepresents a hydrogen atom, a halogen atom or a lower alkylene group; Y represents a group &#x2014;O&#x2014;, a group &#x2014;CO&#x2014;, a group &#x2014;CH(OH)&#x2014;, a lower alkylene group, or the like; and A represents a group or the like, wherein Rrepresents a hydrogen atom, a lower alkoxy group, or the like, p represents 1 or 2, and Rrepresents an imidazolyl lower alkyl group or the like.

Aromatic compounds for suppressing the generation of collagen

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Tokushima, Japan

Hitoshi Nagao