Gigaphoton Inc.

Hitoshi Nagano

Osamu Wakabayashi

Tamotsu Abe

Shinji Nagai

Tatsuya Yanagida

Yasunori Wada

Masaki Nakano

Takayuki Yabu

Takanobu Ishihara

A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

Laser apparatus for generating extreme ultraviolet light

An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Extreme ultraviolet light generation apparatus

System and method for generating extreme ultraviolet light employing laser pulse including pedestal

An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Extreme ultraviolet light generation system

A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.

Growing community of inventors

Hiratsuka, Japan

Hitoshi Nagano