Asahi Glass Company, Limited

Agc Inc.

Hitoshi Mishiro

Shinya Kikugawa

Minoru Tamada

Kaname Okada

Keiko Koyama

Hiroshi Arishima

Naoya Wada

Yoshiaki Ikuta

Kensuke Fujii

Masabumi Ito

Atsushi Nakamura

Yohei Kawai

Shinji Kobune

Katsuhiro Matsumoto

Keigo Hino

Takehiko Nose

Morio Terakado

Takayuki Kawahara

A cover glass includes: a glass substrate having a convex and concave shape formed on at least one of surfaces thereof by an antiglare treatment; and an antireflection film disposed on the surface of the glass substrate, the surface having the convex and concave shape. In the cover glass, a difference Δa* in a* value between any two points within a surface of the cover glass on the side where the antireflection film is present and a difference Δb* in b* value between any two points within the surface of the cover glass on the side where the antireflection film is present satisfy the following expression: √{(Δa*)+(Δb*)}≤4.

Cover glass

The present invention relates to a glass plate which is provided with a first main surface, and a second main surface which faces the first main surface. An antiglare portion and a non-antiglare portion are provided to the first main surface. The average lengths (RSm) of elements of roughness curves of the antiglare portion and the non-antiglare portion are respectively 1 &#x3bc;m or higher. The difference between the RSm of the antiglare portion and the RSm of the non-antiglare portion is 100 &#x3bc;m or lower.

Glass plate

An antiglare glass substrate includes a glass substrate having a first main surface and a second main surface that is opposite to the first main surface. The first main surface has undergone an antiglare treatment and a fluorine-containing organosilicon compound coating film as an antifouling film is laminated thereon. The first main surface partly includes a non-antiglare-treated portion that has not undergone the antiglare treatment. The non-antiglare-treated portion has a surface roughness Ra of less than 10 nm. A difference in height along a plate thickness direction of the glass substrate between the antiglare-treated portion that has undergone the antiglare treatment and the non-antiglare-treated portion is 10 &#x3bc;m or larger and 200 &#x3bc;m or less.

Antiglare glass substrate

A method for measuring the shape of a heating treatment jig to be held by a holding portion of a vertical heat treatment apparatus includes measuring the shape of the heat treatment jig in a state that the position of a supporting portion for supporting the heat treatment jig is set to be the same as the position of the holding portion for the heat treatment jig in the vertical heat treatment apparatus. The heat treatment jig can be used for placing a semiconductor wafer to be subjected to heat treatment.

Method and apparatus for measuring shape of heat treatment jig

A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.

Low-expansion glass substrate for a reflective mask and reflective mask

It is to provide a photomask substrate which has a low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out. A photomask substrate made of a synthetic quartz glass to be used for production of a semiconductor employing a light source having an exposure wavelength of at most about 200 nm, which has a birefringence of at most 1 nm/6.35 mm at the exposure wavelength, and of which the amount of decrease in light transmittance is at most 1.0% as a difference in light transmittance at a wavelength of 217 nm, between before and after irradiation with Xe excimer lamp with an illuminance of 13.2 mW/cmfor 20 minutes.

Photomask substrate made of synthetic quartz glass and photomask

A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.

Structure for attaching a pellicle to a photo-mask

A pellicle formed by bonding a pellicle membrane composed of synthesized glass on a pellicle frame by an adhesive wherein a light shielding member for shielding ultra-violet rays irradiated to the adhesive is provided at a portion where the pellicle membrane is bonded to the pellicle frame, whereby the adhesive for bonding the pellicle membrane to the pellicle frame is prevented from being deteriorated due to the irradiation of ultra-violet rays for cleaning.

Pellicle and method of using the same

It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.

Growing community of inventors

Tokyo, Japan

Hitoshi Mishiro