Nippon Soda Co., Ltd.

Nisso Chemical Analysis Service Co., Ltd.

Hitoshi Matsumoto

Takeshi Shimotori

Hideo Kubo

Yukikazu Nobuhara

Tooru Kawabe

Akira Nakada

Nobuo Matsui

Takeo Shimizu

Kazuo Ono

Tomio Yagihara

Shinichi Kimizuka

Natsuki Amanokura

Mitsuhiro Nakamura

Hirofumi Suzuki

Takehira Kaneko

Shiro Higashida

Nakamura Mitsuhiro

Asami Kobayashi

Emi Nakayama

An object of the present invention is to provide a composition for the formation of a cured epoxy resin, wherein the composition can suppress a curing reaction at a low temperature to thereby enhance one-pack stability, and can also be subjected to a heating treatment to thereby effectively cure a resin. The present invention provides a composition for the formation of a cured epoxy resin, the composition comprising the following components (A), (B) and (C): 

Composition for formation of cured epoxy resin, and cured products thereof

A method for obtaining a star polymer having a controlled ratio of a weight average molecular weight of the star polymer to a number average molecular weight of the star polymer, containing the steps of anionically polymerizing a (meth)acrylic ester having an alicyclic skeleton and a lactone ring in the presence of an anionic polymerization initiator to synthesize an arm polymer, reacting the arm polymer with a polyfunctional coupling agent, and reacting with an anionic polymerizable monomer.

Acrylic star polymer

Disclosed is a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species, wherein the acrylic acid-based polymer comprising a repeating unit derived from a poly(&#x3b1;-lower alkyl)acrylate, and a repeating unit derived from an (&#x3b1;-lower alkyl)acrylic ester represented by formula (I) wherein Rrepresents a hydrogen atom or a lower alkyl group, and Rrepresents an organic group having a polar group in an arm portion.

Method of producing an acrylic acid-based polymer

Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (&#x3b1;-lower alkyl)acrylic ester represented by formula (I): (wherein Rrepresents a hydrogen atom or a lower alkyl group, and Rrepresents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(&#x3b1;-lower alkyl)acrylic ester and a repeating unit derived from an (&#x3b1;-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

Acrylic acid-based polymer and method of producing the same

An ESCAP type polymer which has a controlled structure wherein the groups protecting phenolic hydroxyl groups have been selectively or partly eliminated or decomposed with an acid and no carboxylic acid residues are contained and which is a narrow-disperse polymer and is suitable for use as a material for a chemical amplification type resist for excimer lasers which has excellent resolution. The process is characterized by subjecting either an alkenylphenol in which the phenolic hydroxyl group has been protected or the alkenylphenol and a vinylaromatic compound to anionic polymerization together with a (meth)acrylic ester to give a block copolymer and eliminating only a given proportion of the groups protecting the phenolic hydroxyl groups from the block copolymer with an acid reagent. Thus, an alkenylphenol copolymer is synthesized which has a ratio of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn), (Mw/Mn), of 1.00 to 1.50 and has no carboxylic acid residues.

Alkenylphenol copolymer and process for producing the same

A novel star block copolymer which can be made to have a high molecular weight and gives a solution having a lower viscosity than solutions of linear polymers having the same molecular weight as the copolymer and which is expected to be used as a resist material; and a process for producing the copolymer. The star block copolymer having alkenylphenol skeletons is obtained by homopolymerizing by living anion polymerization an alkenylphenol compound in which the hydroxyl group of the phenol moiety has been protected by a saturated aliphatic protective group or copolymerizing the alkenylphenol compound with a vinylaromatic compound by living anion polymerization, subsequently copolymerizing the resultant polymer using a polyfunctional coupling agent such as divinylbenzene to obtain a star block copolymer, and eliminating the saturated aliphatic protective groups with an acid reagent.

Star block copolymer

By the selective use of a homogeneous stable precursor solution in which no polymerization reactions immediately occur and which contains aromatic compounds such as pyrrole, thiophene, aromatic amines or their derivatives, oxidizing agents, and solvents, as a precursor solution of conductive polymer film, a homogeneous and tough conductive polymer film can be obtained when the said precursor solution is cast on a substrate and the solvents are evaporated to remove.

Method for the preparation of conductive polymer film

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Chiba, Japan

Hitoshi Matsumoto