Semiconductor Energy Laboratory Co., Ltd.

Hitoshi Kunitake

Shunpei Yamazaki

Takayuki Ikeda

Hajime Kimura

Kazuki Tsuda

Tatsuya Onuki

Yuto Yakubo

Tomoaki Atsumi

Kiyoshi Kato

Hiromichi Godo

Shuhei Nagatsuka

Kazuaki Ohshima

Satoru Ohshita

Takanori Matsuzaki

Yuki Okamoto

Satoru Okamoto

Takahiro Fukutome

Yuichi Yanagisawa

Haruyuki Baba

Ryunosuke Honda

Tomonori Nakayama

Masahiro Takahashi

Shota Mizukami

Eri Sato

Yoshiyuki Kurokawa

Hideki Uochi

Koji Kusunoki

Yoshiaki Oikawa

Yasuhiro Jinbo

Munehiro Kozuma

Takeshi Aoki

Masashi Oota

Naoki Okuno

Tatsunori Inoue

Minato Ito

Yoko Tsukamoto

A computer system with a small circuit area and reduced power consumption is used. The computer system includes a computer node including a processor and a three-dimensional NAND memory device. The three-dimensional NAND memory device includes a first string and a second string in different blocks. The first string includes a first memory cell, and the second string includes a second memory cell. On reception of first data and a signal including an instruction to write the first data, the controller writes the first data to the first memory cell. Then, the controller reads the first data from the first memory cell and writes the first data to the second memory cell. Thus, the computer node can eliminate a main memory such as a DRAM from the structure.

Computer system using 3D OS NAND

A ferroelectric device () that includes a metal nitride film () with favorable ferroelectricity is provided. The ferroelectric device comprises a first conductor (), a metal nitride film over the first conductor, a second conductor () over the metal nitride film, a first insulator () over the second conductor, and a second insulator () over the first insulator. The first insulator includes regions in contact with the side surface of the metal nitride film and the side surface and the top surface of the second conductor; the metal nitride film has ferroelectricity; the metal nitride film contains a first element, a second element, and nitrogen; the first element is one or more elements selected from Group 13 elements; the second element is one or more elements selected from Group 2 elements to Group 6 elements and Group 13 elements other than the first element; the first conductor and the second conductor each contain nitrogen; the first insulator contains aluminum and oxygen; and the second insulator contains silicon and nitrogen.

Ferroelectric device and semiconductor device

A small-size semiconductor device is provided. The semiconductor device includes a first layer, a second layer, and a third layer formed over a substrate. A first transistor included in the first layer includes a first semiconductor layer containing Si. A second transistor included in the second layer includes a second semiconductor layer containing Ga. A third transistor included in the third layer includes a third semiconductor layer containing at least one of In and Zn. The first semiconductor layer of the first transistor is formed using the substrate. The second semiconductor layer of the second transistor is formed using a crystal obtained by crystal growth over the substrate. The third semiconductor layer of the third transistor is formed above the first semiconductor layer and the second semiconductor layer.

Semiconductor device

A highly reliable memory device is provided. The memory device includes a first conductor, a second conductor above the first conductor, a third conductor above the second conductor, a fourth conductor above the third conductor, a fifth conductor above the fourth conductor, a sixth conductor above the fifth conductor, a seventh conductor, a first insulator, a second insulator, a first semiconductor, and a second semiconductor. At least third conductor and the fourth conductor have an opening. The first insulator, the first semiconductor, the second insulator, and the second semiconductor are provided in this order on an inner surface of the opening. The seventh conductor is provided between the first semiconductor and the second insulator in a region between the third conductor and the second insulator. The first semiconductor is electrically connected to the second conductor and the fifth conductor. The second semiconductor is electrically connected to the first conductor and the sixth conductor.

Memory device and method for manufacturing the same

To provide a semiconductor device with a novel structure. The semiconductor device includes an accelerator. The accelerator includes a first memory circuit, a second memory circuit, and an arithmetic circuit. The first memory circuit includes a first transistor. The second memory circuit includes a second transistor. Each of the first transistor and the second transistor includes a semiconductor layer including a metal oxide in a channel formation region. The arithmetic circuit includes a third transistor. The third transistor includes a semiconductor layer including silicon in a channel formation region. The first transistor and the second transistor are provided in different layers. The layer including the first transistor is provided over a layer including the third transistor. The layer including the second transistor is provided over the layer including the first transistor. The data retention characteristics of the first memory circuit are different from those of the second memory circuit.

A semiconductor device capable of measuring a minute current is provided. The semiconductor device includes an operational amplifier and a diode element. An inverting input terminal of the operational amplifier and an input terminal of the diode element are electrically connected to a first terminal to which current is input, and an output terminal of the operational amplifier and an output terminal of the diode element are electrically connected to a second terminal from which voltage is output. A diode-connected transistor that includes a metal oxide in a channel formation region is used as the diode element. Since the off-state current of the transistor is extremely low, a minute current can flow between the first terminal and the second terminal. Thus, when voltage is output from the second terminal, a minute current that flows through the first terminal can be estimated from the voltage.

Semiconductor device, semiconductor wafer, and electronic device

A novel semiconductor device is provided. A component extending in a first direction, and a first conductor and a second conductor extending in a second direction are provided. The component includes a third conductor, a first insulator, a first semiconductor, and a second insulator. In a first intersection portion of the component and the first conductor, the first insulator, the first semiconductor, the second insulator, a second semiconductor, and a third insulator are provided concentrically. In a second intersection portion of the component and the second conductor, the first insulator, the first semiconductor, the second insulator, a fourth conductor, and a fourth insulator are provided concentrically around the third conductor.

Semiconductor device and electronic device

A semiconductor device with low power consumption is provided. In a cascode circuit including a first transistor provided on a low power supply potential side and a second transistor provided on a high power supply potential side, a source or a drain of a third transistor and a capacitor are connected to a gate of the second transistor. A gate of the first transistor is electrically connected to a back gate of the second transistor. An OS transistor is used as the third transistor.

A semiconductor device with low power consumption that is capable of non-destructive reading is provided. The semiconductor device includes a first transistor, a second transistor, a third transistor, a first FTJ element, and a second FTJ element. A first terminal of the first transistor is electrically connected to an output terminal of the first FTJ element, an input terminal of the second FTJ element, and a gate of the second transistor. A first terminal of the second transistor is electrically connected to a second terminal of the third transistor. For data writing, polarization is caused in each of the first FTJ element and the second FTJ element in accordance with data. For data reading, a voltage that does not cause a change in polarization is applied between the input terminal of the first FTJ element and the output terminal of the second FTJ element, a potential is supplied to the gate of the second transistor, and a current or voltage corresponding to data is obtained from the first terminal of the second transistor.

A semiconductor device in which an electrification phenomenon that leads to characteristic fluctuations, element deterioration, or dielectric breakdown is inhibited is provided. A first transistor, a second transistor, a third transistor, and a fourth transistor are included over a substrate; the fourth transistor includes a first conductor, a second conductor, a third conductor, and an oxide semiconductor; the first conductor is electrically connected to the semiconductor substrate through the first transistor; the second conductor is electrically connected to the semiconductor substrate through the first transistor; the third conductor is electrically connected to the semiconductor substrate through the first transistor; and the fourth conductor is electrically connected to the semiconductor substrate through the first transistor.

Semiconductor material and semiconductor device

A semiconductor device in which an electrification phenomenon that leads to characteristic fluctuations, element deterioration, abnormality in shape, or dielectric breakdown is inhibited is provided. The semiconductor device includes a first region and a second region over the same plane. The first region includes a transistor. The second region includes a dummy transistor. The transistor includes a first wiring layer, a semiconductor layer including an oxide and provided above the first wiring layer, a second wiring layer provided above the semiconductor layer, and a third wiring layer provided above the second wiring layer. The dummy transistor has the same area as one or more selected from the first wiring layer, the second wiring layer, the semiconductor layer, and the third wiring layer.

Malfunctions of a circuit is prevented and the reliability of a semiconductor device using the circuit is improved. The semiconductor device includes a first transistor, a second transistor, a load, and a wiring having a function of supplying a power supply potential to the load. A semiconductor layer of the first transistor includes an oxide semiconductor. A semiconductor layer of the second transistor includes an oxide semiconductor. A source and a drain of the first transistor are electrically connected to the wiring. A first gate of the first transistor is supplied with a reference potential. A source and a drain of the second transistor are supplied with the reference potential. A first gate of the second transistor is electrically connected to the wiring. The semiconductor layer of the first transistor includes a region overlapping with the wiring. The semiconductor layer of the second transistor includes a region overlapping with the wiring.

Semiconductor device comprising transistor, load, and wiring configured to supply power supply potential to the load

A display device with a novel structure is provided. The display device includes a first substrate provided with a plurality of pixels including a display element, and a second substrate including a first conductive layer provided with a plurality of first openings. The first conductive layer has a function of an antenna capable of transmitting and receiving a radio signal. The pixel and the first opening include a region where the pixel and the first opening overlap with each other. The second substrate includes an element layer. The element layer includes a transistor. The transistor has a function of an amplifier capable of amplifying the radio signal. The transistor each includes a semiconductor layer including a metal oxide in a channel formation region. The metal oxide contains In, Ga, and Zn.

Display device

Provided is a semiconductor device capable of retaining data for a long time. The semiconductor device includes a cell provided with a capacitor, a first transistor, and a second transistor; the capacitor includes a first electrode, a second electrode, and a ferroelectric layer; the ferroelectric layer is provided between the first electrode and the second electrode and polarization reversal occurs by application of a first saturated polarization voltage or a second saturated polarization voltage whose polarity is different from that of the first saturated polarization voltage; and the first electrode, one of a source and a drain of the first transistor, and a gate of the second transistor are electrically connected to one another. In a first period, the first saturated polarization voltage is applied to the ferroelectric layer. In a second period, a voltage having a value between the first saturated polarization voltage and the second saturated polarization voltage is applied to the ferroelectric layer as a data voltage.

Driving method of semiconductor device

To provide a mixer and a semiconductor device which each have a small circuit area and each of which operation capability is inhibited from being decreased due to heat. The mixer includes a differential portion, a current source, a first load, an input terminal, and a first output terminal; the differential portion includes a first and a second transistor; and each of the first and the second transistors includes a metal oxide in a channel formation region. A first terminal of each of the first and the second transistors is electrically connected to the input terminal and a current source and a second terminal of the first transistor is electrically connected to a first terminal of the first load and the first output terminal. The first load has a function of supplying a current between the first terminal and a second terminal of the first load by application of voltage to the second terminal of the first load, and the current source has a function of supplying a constant current to the current source from the first terminal of each of the first and the second transistors. The current source includes a transistor including silicon in a channel formation region, and the differential portion is positioned above the current source.

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Kanagawa, Japan

Hitoshi Kunitake