Kabushiki Kaisha Toshiba

Ricoh Company, Ltd.

Juki Corporation

Hitoshi Itoh

Keiji Kojima

Fumihiro Nakashige

Fumihiro Hasegawa

Takahiko Moriya

Shinji Aoki

Hiroshi Watanabe

Kenji Kobayashi

Takashi Endo

Akihiro Kajita

Tohru Watanabe

Iwao Kunishima

Rempei Nakata

Makoto Nagamine

Ken Uchida

Shuji Fujita

Shinji Yamakawa

Kouichi Muraoka

Shiro Satoma

Kenichi Otsuka

Yasushi Baba

Johta Fukuhara

Mitsuyoshi Mineyama

Katsuhiko Oya

A lighting device includes: a light emitting device including a plurality of light emitting elements arranged in curve having a first curvature; and a honeycomb member having an extendable and contractible honeycomb structure, arranged in curve having a second curvature larger than the first curvature, in an emission direction of light emitted from the light emitting device.

Lighting device, and apparatus and system incorporating the lighting device

A correction-coefficient calculating unit calculates a correction coefficient to correct misalignment between a first print image and a second print image. A correcting unit corrects the first print image based on the correction coefficient to obtain a corrected first image. A pixel-value determining unit assigns a pixel value based on pixel-value matching state at corresponding positions in the corrected first image and the second print image. An image generating unit generates a misalignment display image from the corrected first image and the second print image that is assigned a predetermined pixel value. An output unit that outputs the misalignment display image.

Misalignment detecting apparatus, misalignment detecting method, and computer program product

An image inspecting apparatus includes a first light illuminating unit that irradiates a measured object on which an image is formed with illuminating light from a diagonal direction; an imaging unit that receives specular light of the illuminating light with which the measured object is irradiated by the first light illuminating unit; and an image inspecting unit that inspects the image. The image inspecting unit generates gloss reference data from density distribution data included in print data used for forming the image by using a converting unit. The image inspecting unit inspects a gloss distribution of the image by using the gloss reference data and a gloss distribution of the image that is generated based on an amount of the specular light received by the imaging unit.

Method and apparatus for inspecting image, image forming apparatus, and computer-readable recording medium storing image inspecting program

A printed matter examination apparatus includes a master data acquiring unit configured to acquire master data that is data for printing and contains code information that is converted for printing; a code information acquiring unit configured to acquire unconverted code information; a code information recognition unit configured to recognize the converted code information from the acquired master data; and a code information examination unit configured to compare the converted code information recognized by the code information recognition unit with the acquired unconverted code information and determine that the converted code information is incorrect when the converted code information is not identical to the unconverted code information.

Printed matter examination apparatus, printed matter examination method, and printed matter examination system

An image inspecting apparatus includes a first light illuminating unit irradiating a measured object on which an image is formed with light from an inclined direction; a second light illuminating unit irradiating the measured object with light from a different direction; an imaging unit receiving reflected light of the light with which the measured object is irradiated by the first light illuminating unit and the second light illuminating unit; a first and a second reference plate having a mirror surface and a diffuse surface, respectively; and an image inspecting unit inspecting a gloss distribution of the image based on the amount of light received by the imaging unit and a correcting coefficient.

Image inspecting apparatus, image inspecting method, and image forming apparatus

An image processing apparatus includes a scanning unit configured to scan at least one of two surfaces of a printed material on both of which information is printed and to obtain a density image representing intensity distribution of diffuse reflection light from the scanned surface and a gloss image representing intensity distribution of specular reflection light from the scanned surface, a mask image generating unit configured to generate a mask image for the scanned surface based on the obtained gloss image, and a show-through removing unit configured to perform mask processing on the density image using the generated mask image to generate a show-through-removed image that does not include show-through information for the scanned surface.

Image processing apparatus, method, and program product removing show-through from density image using mask image generated from gloss image

In an image processing device which compresses image data which is created by electronizing of a document, to generate compressed image data, a document type judgment unit determines a type of document from the image data. An image compression unit performs a compression encoding of the image data based on a result of the determination of the document type judgment unit.

Image processing device, image compression method, image compression program, and recording medium

Image forming apparatus, which prevents the occurrence of displacement of the positions of pixels between image data items forming a synthetic image, and eliminates distortion of a character and color shift in character regions and non-character regions. An image size adjustment section obtains, when synthesizing a plurality of image data items to create one image, a remainder by dividing the number of vertical and horizontal pixels of input image data by a least common multiple of the ratio of resolutions of a plurality of image data items, for vertical and horizontal directions of the image. The input image data is processed by means of the result of computing the remainder, so that the remainder becomes 0 when obtaining the remainder by dividing the number of vertical and horizontal pixels of the input image data by the least common multiple of the ratio of the resolutions of the image data items.

Image processing apparatus

An apparatus, method, system, computer program and product, each capable of compressing a multivalue image with control of memory space requirement.

Compressing a multivalue image with control of memory space requirement

A method of manufacturing a semiconductor device, which comprises a step of forming an oxide film by oxidizing a surface of semiconductor layer in an atmosphere containing an oxygen-activated species at a temperature of over 550&deg; C. A method of manufacturing a semiconductor device, which comprises the steps of forming an oxide film by oxidizing a surface of semiconductor in an atmosphere containing an oxygen-activated species, and removing the oxide film so as to expose a surface of the semiconductor. A method of manufacturing a semiconductor device which comprises a step of feeding an oxidizing source gas comprising as a main component oxygen atomic radicals of singlet state in an excited state to a silicon layer thereby to oxidize a surface of the silicon layer, thus forming a silicon oxide film.

Semiconductor device manufacturing method, semiconductor device manufacturing apparatus and semiconductor device

Semiconductor device, and method of fabricating the same

The present invention provides a method of forming a film, having the step of allowing a first chemical substance to be adsorbed on a surface of a silicon substrate by a gaseous phase method, and the step of introducing a gas containing a second chemical substance onto the substrate surface having the first chemical substance adsorbed thereon for forming a silicon compound layer on the silicon substrate, the silicon compound layer consisting essentially of a silicon compound formed by a reaction between the first chemical substance adsorbed on the substrate surface and the second chemical substance. The film-forming method of the present invention is featured in that one of the first and second chemical substances contains silicon and the other chemical substance contains an element other than silicon, that the step of forming the silicon compound layer is continued until the reaction between the first chemical substance and the second chemical substance is saturated, and that the step of allowing the first chemical substance to be adsorbed on the substrate surface and the step of forming the silicon compound layer are carried out alternately and a plurality of times.

Film-forming method and film-forming apparatus

The present invention provides a method of selectively depositing a metal film in an opening of an insulating layer formed on a semiconductor substrate, the opening exposing a surface of at least one of a metal layer, a semiconductor layer, and a semiconductor substrate, the method including the steps of exposing a surface of insulating layer and the substrate surface to a gas plasma which consists of at least one of an inert gas and hydrogen, exposing the insulating layer to a gas containing halogen atoms other than fluorine atoms, and selectively depositing a metal film in the opening of the insulating layer.

Method of selectively depositing a metal film

This invention provides a method of manufacturing a semiconductor device, including the steps of forming an insulating film and a first metal film on one major surface of a semiconductor substrate, each of the insulating film and the first metal film having a partially exposed surface, and selectively forming a second metal film on the exposed surface of the first metal film, wherein formation of the second metal film is performed in an atmosphere containing a gasified silicon compound obtained upon gasifying a liquid silicon compound containing at least one element selected from the group consisting of carbon, hydrogen, oxygen, chlorine, and fluorine, or its reaction product, whereby the exposed surface of the insulating film is chemically modified with the silicon compound or its reaction product.

Method of manufacturing a semiconductor device

A method of manufacturing a semiconductor device comprising the steps of forming an insulating layer on a first conductive layer deposited on a semiconductor substrate, treating the surface of the insulating layer and the exposed surface of the first conductive layer with a gas plasma containing halogen atoms, and depositing selectively a conductive material by vapor growth on the exposed surface of the first conductive layer so as to form a second conductive layer. The gas plasma containing halogen atoms can be formed by introducing a gas containing halogen atoms into the treatment chamber housing the sample, and applying high frequency power. The gas plasma containing halogen atoms can be formed by introducing a gas containing halogen atoms into the treatment chamber to adsorb the halogen atoms on the inner wall of the chamber, and applying high frequency power. Alternatively, the gas plasma can be formed by applying high frequency power after placing the sample and a halogen containing material inside the chamber. By treatment with the gas plasma containing halogen atoms, a second conductive layer can be deposited with good selectivity.

Growing community of inventors

Tokyo, Japan

Hitoshi Itoh