Nikon Corporation

Hitoshi Hatada

Masaki Kato

Hiroshi Shirasu

Masato Kumazawa

Motoo Koyama

Hidetsugu Takagi

Masahiro Iguchi

A microscope objective lens (OL) is constituted by a first lens group (G), a second lens group (G) having a positive refractive power, a third lens group (G) having a concave surface facing the image side, and a fourth lens group (G) having a concave surface facing the object side. The first lens group (G) is constituted by a plano-convex positive lens (L) having a flat surface facing the object side, and a negative lens (L) and satisfies the following conditional: 1.8<H/H<3.5 and 1.3<DLe/H<3.5, where: His the distance between the optical axis and the light ray most separated from the optical axis in the second lens group (G), from among light rays emitted from an object (OB) on the optical axis; His the distance between the optical axis and the light ray most separated from the optical axis at a lens surface on the image side of a final lens (Le); and DLe is the length of the final lens (Le) on the optical axis.

Microscope objective lens, microscope optical system, and microscope device

An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in &#x2212;X direction.

Exposure apparatus, exposure method and device fabricating method

When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a', which orthogonally projects point a on the plate, and a second line segment linking point B and point b&#x2032;, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.

Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method

The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.

Growing community of inventors

Sagamihara, Japan

Hitoshi Hatada