The Kansai Electric Power Co., Inc.

Mitsubishi Heavy Industries Limited

Nissan Chemical Industries Limited

Mitsubishi Jukogyo Kabushiki Kaisha

Nippon Kayaku Kabushiki Kaisha

Hitomi Suzuki

Masaki Iijima

Tomio Mimura

Shigeaki Mitsuoka

Toru Iwaki

Hiroshi Tanaka

Katsuaki Miyaji

Keizo Tanikawa

Koichi Maeda

Shigeru Shimojo

Hidenobu Shimayoshi

Kenkichi Tsukamoto

Takashi Murashima

Atsushi Hayakawa

Nobuhiro Suzuki

This invention provides a method for the removal of carbon dioxide present in gases which comprises bringing a CO.sub.2 -containing gas into contact with an aqueous solution containing at least one amine compound of the general formula ##STR1## wherein R.sup.1 to R.sup.8 may be the same or different and each represent a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, and m is 0 or 1. The method of the present invention makes it possible to remove carbon dioxide efficiently. In particular, since carbon dioxide can be easily desorbed by heating the aqueous solution having absorbed carbon dioxide, the thermal energy required for regeneration of the aqueous solution can be reduced.

Method for the removal of carbon dioxide present in gases and absorbent

Organic bismuth derivatives for X-ray imaging

This invention provides a method for the removal of carbon dioxide present in gases which comprises bringing a CO.sub.2 -containing gas into contact with an aqueous solution containing at least one amine compound of the general formula �1! ##STR1## wherein R.sup.1 to R.sup.8 may be the same or different and each represent a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, and m is 0 or 1. The method of the present invention makes it possible to remove carbon dioxide efficiently. In particular, since carbon dioxide can be easily desorbed by heating the aqueous solution having absorbed carbon dioxide, the thermal energy required for regeneration of the aqueous solution can be reduced.

Method for the removal of carbon dioxide present in gases

Tris(substituted phenyl) bismuth derivatives

This invention relates to the process for removing CO.sub.2 from CO.sub.2 -containing gas such as combustion gas. For example, it is the process for removing CO.sub.2 from combustion gas through the contact of the gas at the atmospheric pressure with an aqueous solution of an amine represented by the general formula R.sup.1 NHC(CH.sub.3).sub.2 CH.sub.2 OH in which R.sup.1 is a lower alkyl group having 1-4 carbon atoms, or an aqueous solution containing both an amine represented by the general formula R.sub.2 CHR.sub.3 NHCH.sub.2 CH.sub.2 OH in which R.sup.2 is a hydrogen atom or a lower alkyl group having 1-4 carbon atoms and R.sup.3 is a hydrogen atom or methyl group and a piperazine compound selected from the group consisting of piperazine, 2-methylpiperazine, 2,3-dimethylpiperazine, and 2,5-dimethylpiperazine, or an mixed aqueous amine solution containing a secondary amine and a tertiary amine at concentrations of 10-45% by weight each, or an aqueous solution of a piperazine derivative.

Process for removing carbon dioxide from gases

Non-pollutional process for producing aromatic nitro compounds without

Growing community of inventors

Matsuyama, Japan

Hitomi Suzuki