Kabushiki Kaisha Topcon

Topcon Corporation

Horiba, Ltd.

Tokyo Electron Limited

Hisashi Isozaki

Hiroshi Yoshikawa

Michihiro Yamazaki

Yutaka Shida

Yoichiro Iwa

Yoshiyuki Enomoto

Hiroyuki Maekawa

Fumio Ohtomo

Atsushi Shoji

Naoto Miki

Takuji Sato

Takashi Kakinuma

Takehiro Takase

Akira Ooide

Susumu Saito

Akihiko Sekine

Kazunori Sato

Hirotaka Tanaka

Hisakazu Yoshino

Kazuo Nunokawa

Naohiro Takahashi

Noritaka Nishioka

Akira Noda

Masanori Matsuda

Hiroaki Soma

Fumio Koda

The temperature measurement device includes a thermographyfor measuring a temperature distribution of a predetermined range in a non-contact manner; a calibratorincluding at least one heaterable to generate heat to a preset temperature; thermistorstoprovided on installation points on the calibrator, and measuring temperatures at the installation points, the installation points having different temperatures; and a controllerfor calibrating a first temperature measurement result obtained from a temperature distribution of a range covering an object (an eye E of a calf C) measured by the thermography, based on temperature differences between a second temperature measurement result obtained from a temperature distribution of a range covering the calibratormeasured by the thermographyand a third temperature measurement result obtained from a temperature distribution of the calibratormeasured by the thermistorsto

Temperature measurement device and temperature measurement method

The invention provides an illuminance measuring system, which comprises an illuminance measuring instrument which comprises a first communication unit and is moved by a moving vehicle, a position measuring means which comprises a second communication unit and measures a three-dimensional position of the illuminance measuring instrument and a data collector which comprises a third communication unit and a storage unit for storing positional information data of a predetermined measuring point, wherein the data collector moves the moving vehicle to the measuring point based on a position of the illuminance measuring instrument and the positional information data, an illuminance is measured and a position of the illuminance measuring instrument is measured, and wherein the data collector obtains an illuminance measurement result from the illuminance measuring instrument, obtains a measuring position from the position measuring means, and collects the illuminance measurement result and the measuring position in association with each other.

Illuminance measuring system

The invention provides a management system for an illumination facility, which comprises an illuminance measuring instrument, a position detector for detecting a position of the traveling vehicle, and an arithmetic device, which are mounted on a traveling vehicle, wherein the arithmetic device is configured to save a map information, positional data of an illumination lamp, initial data including illuminance data, and the illuminance data as acquired by the illuminance measuring instrument while driving the traveling vehicle, and wherein the arithmetic device is configured to calculate daily management data of the illumination facility based on the positional data of the traveling vehicle as detected by the position detector, the map information, and the illuminance data, and further wherein the arithmetic device is configured to calculate a change of the illumination facility including the illumination lamp based on the initial data and the daily management data.

Management system for illumination facility

The invention provides an illuminance measuring system, which comprises an illuminance measuring instrument which comprises a first communication unit and is moved by a moving vehicle, a position measuring means which comprises a second communication unit and is capable of measuring a three-dimensional position of the illuminance measuring instrument and a data collector which comprises a third communication unit and a storage unit for storing positional information data of a predetermined measuring point, wherein the data collector moves the moving vehicle to the measuring point based on a position of the illuminance measuring instrument as measured by the position measuring means and the positional information data, an illuminance is measured by the illuminance measuring instrument and a position of the illuminance measuring instrument at the time of illuminance measurement is measured by the position measuring means, and wherein the data collector obtains an illuminance measurement result from the illuminance measuring instrument via the first communication unit and the third communication unit, obtains a measuring position from the position measuring means via the second communication unit and the third communication unit, and collects the illuminance measurement result and the measuring position in association with each other.

A spatial light measuring system is disclosed, which is configured to store illuminance data acquired by measurement in a new state as initial data, to make the traveling vehicle run after acquiring the initial data, to save illuminance data acquired by the illuminance measuring instrument as daily management data, and to specify an illuminance measuring position and an image acquiring position based on the speed of the traveling vehicle and to use a correction coefficient due to a distance from the ground to an illuminance measuring instrument mounting position and a correction coefficient due to the speed of the traveling vehicle and is configured to correct daily management data into illuminance data on the ground based on both the correction coefficients and to judge the soundness of the illumination facility based on a comparison between the illuminance data as corrected, the initial data and based on the images as acquired.

Spatial light measuring method and spatial light measuring system

The present invention provides an electron microscope device, comprising a scanning electron microscopeprovided with scanning meansfor scanning an electron beam and an electron detectorfor detecting an electronissued from a specimenwhere the electron beam is projected for scanning, wherein a scanning electron image is acquired based on a detection result from the electron detector, wherein the electron detector comprises a fluorescent substance layer for performing photoelectric conversion, a wavelength filter giving restriction so that all or almost all of wavelength ranges of fluorescent lights from the fluorescent substance layer can be transmitted, and a wavelength detecting element for receiving the fluorescent light transmitted through the wavelength filter and for performing photoelectric conversion.

Electron microscope device

The present invention provides an electron microscope device, comprising a scanning electron microscopeand an optical microscope, wherein the scanning electron microscope has scanning meansfor scanning an electron beam and an electron detectorfor detecting electronissued from a specimenscanned over by the electron beam, and the scanning electron microscope acquires a scanning electron image based on a detection result from the electron detector, the optical microscope has a light emitting sourcefor illuminating an illumination light, and the optical microscope illuminates the illumination light to the specimen, and acquires an optical image by receiving a reflection light from the specimen, and wherein the electron detector has a fluorescent substance layer for electron-light conversion, a wavelength filter for restricting so that all or almost all of wavelength ranges of the fluorescent light from the fluorescent substance layer passes through, and a wavelength detecting element for receiving the fluorescent light passing through the wavelength filter and performing optical-electric conversion, wherein the light amount of the illumination light in the wavelength range passing through the wavelength filter does not exceed a limit of deterioration of the scanning electron image.

A complex type microscopic device includes a slider unit moving a stage, an optical microscope, a scanning electron microscope with an electron axis intersecting with an optical axis of the optical microscope, an optical measurement/observation unit having a magnification between those of the scanning electron microscope and the optical microscope and co-using an objective lens with the optical microscope, and a control unit controlling the entire device, and a display unit having a display screen. During display of a low-magnification optical microscopic image, the control unit controls the display unit to display, on the image, a representation to designate an area to be observed at a magnification of the optical measurement/observation unit, and to display, on the image, another representation to designate an area to be observed at a magnification of the scanning electron microscope during display of a high-magnification optical microscopic image.

Complex type microscopic device

A measuring apparatus measuring a surface shape of a target includes a projection optical system to radiate a line beam on the target, an imaging device to acquire a reflected line beam reflected from the target, an optical imaging system to cause the reflected line beam to form an image on a receiving surface of the imaging device to acquire a shape of the line beam on the target, and a splitting mechanism to split the reflected line beam so as to acquire the shape of the line beam on the target at different positions in an extending direction of the line beam and guide the split reflected line beams to the imaging device. A plurality of segments are set on the receiving surface while each segment in which at least one region is set as a reception region is partitioned into a plurality of regions, and the optical imaging system causes the split reflected line beams to form images on the reception regions in the different segments, respectively.

Measuring apparatus

The present invention provides an electron microscope devicecomprising a scanning electron microscopeand an optical microscopewherein the scanning electron microscope has scanning meansfor scanning an electron beam and an electron detectorfor detecting electrons issued from a specimenscanned by the electron beam, and the scanning electron microscope acquires a scanning electron image based on a detection result from the electron detector, wherein the optical microscope projects an illumination light to the specimen, receives a reflection light from the specimen and acquires an optical image, and wherein an optical axisof the scanning electron microscope crosses an optical axisof the optical microscope at a point of observation of the specimen, wherein the scanning means projects the electron beam for scanning with a scanning width wider than a width of a scanning area, the optical microscope projects an illumination light and acquires an optical image in an overrunning portion where the electron beam is projected beyond the scanning area, and the scanning electron microscope acquires a scanning electron image based on electrons issued when the electron beam scans over the scanning area.

A light source section outputs optical flux having two types of wavelength, which are a short wavelength and a long wavelength, while the intensity is made variable. The output from the first light intensity detecting section in irradiating the optical flux having a short wavelength is compared with the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength. A disappearance level near a point where the detected signal from the internal subject disappears is calculated. The first intensity of optical flux having a long wavelength is set to level higher than the disappearance level. Based on the output from the first light intensity detecting section obtained by the optical flux having a long wavelength of the first intensity, a subject inside the body to be detected is measured.

Surface inspecting method and device

A method and an apparatus of inspecting the surface of a wafer, where two or more kinds of laser are switched or mixed to make the laser incident on the film-coated wafer by a same incident angle, in which inspection data regarding an inspection apparatus and film parameters regarding a film are stored in storage means of the inspection apparatus in an associated state with each other so as to obtain predetermined inspection conditions. When performing each measurement, an operator sets the film parameters of the wafer to be measured by setting means of the inspection apparatus. Thus, desired inspection conditions are automatically set in the inspection apparatus. The film parameters that the operator sets at each measurement are a film thickness and a film refraction index.

Surface inspection method and apparatus

A particle detecting method which is capable of detecting the number of low-speed particles accurately, and a storage medium storing a program for implementing the method. Intensity of scattered light generated when a light emitted into a gas stream is scattered by a particle is measured using a light receiving sensor at predetermined time intervals. A measuring time period for measuring the scattered light intensity is divided into measurement periods each defined as a predetermined time period, and a measured time point in each measurement period is selected at which a maximum value of the scattered light intensity measured is measured. The number of particles having passed by in front of the light receiving sensor is counted based on the measured time point selected in each measurement period.

Particle detecting method and storage medium storing program for implementing the method

A method for surface inspection, comprising the step of projecting at least two laser beams with different wavelengths to a same point to be inspected via a same projecting lens, the step of setting incident angles of the two laser beams so that fluctuations of values of reflectivity of the laser beams are complementary to each other, and the step of detecting reflected scattered light components.

Method and device for surface inspection

A surface inspection method in a surface inspection system which comprises a photodetection unit and a photodetection polarizing angle changing means, comprising the step of receiving a scattered reflection light from a substrate surface where standard particles are coated by changing a photodetection polarizing angle by the photodetection polarizing angle changing means, and the step of performing surface inspection by setting the photodetection polarizing angle to a condition where an S/N ratio of photodetection output is at the highest.

Growing community of inventors

Tokyo-to, Japan

Hisashi Isozaki