Hitachi Chemical Company, Ltd.

Hisao Tanaka

Isao Uchigasaki

Hiromi Kochi

Kanemasa Nomaguchi

Shungi Masuda

Shunji Masuda

Yoshinori Oyama

Shigeaki Muto

Takehisa Sasaki

A method which comprises drawing a part of the reaction liquid from a reactor for unsaturated polyesters, bringing the drawn liquid into contact and reaction with a gaseous starting material or a liquid starting material capable of being converted into vapor on reaction, for example, an alkylene oxide by means of tubular mixing and recycling this reaction liquid to the reactor thereby preventing increase in pressure of the reactor. An apparatus which comprises a reactor having a confined or open structure, a tubular mixer where a part of the reaction liquid drawn from the reactor is mixed with a gaseous starting material or a liquid starting material capable of being converted into vapor on reaction, which is blown through a nozzle, to cause a vapor-liquid reaction, and a liquid circulation pump for supplying the liquid drawn from the reactor to the tubular mixer and recycling the vapor-liquid reaction product to the reactor.

Method for conducting a vapor-liquid contact reaction semi-batchwise

An alkyd-type resin composition comprising a chelate compound represented by the formula ##EQU1## wherein M is a metal of the first transition metal group (except for nickel), lead, or zirconium; Ar.sub.1 and Ar.sub.2 are each an aromatic residue, a substituted aromatic residue, or a heterocyclic aromatic residue; R, R.sub.1 and R.sub.2 are each hydrogen, an alkyl residue, a cycloaliphatic alkyl residue, an aromatic residue, a substituted aromatic residue, or a jointed residue of these radicals, and the carbon chains of R, R.sub.1 and R.sub.2 may contain hetero atoms such as oxygen, nitrogen, or sulfur. The said resin composition is characterized by little change in properties with the lapse of time, accelerated curing, and improved drying characteristics without gel formation in the surface layer of the resin.

Alkyd-type resin composition containing chelate compound having

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Hitachi, Japan

Hisao Tanaka