Dainippon Screen Mfg. Co., Ltd.

Kabushiki Kaisha Kobe Seiko Sho

Kobe Steel, Ltd.

Other

Hisanori Oshiba

Kimitsugu Saito

Yusuke Muraoka

Yoshihiko Sakashita

Ikuo Mizobata

Ryuji Kitakado

Katsumi Watanabe

Masahiro Yamagata

Shogo Sarumaru

Yoichi Inoue

Tomomi Iwata

Yasuhiko Fujieda

Eiji Fukatsu

Jun Munemasa

Hiroyuki Ueno

Takashi Gama

Yasuo Okuyama

A mixing valve assemblyis communicated with a dedicated tankD, storing therein a compatibilizer D, via an inlet valveand is also communicated with dedicated tanksA-C via three injection valves, the tanks storing therein auxiliaries A-C respectively. A chemical formulation is prepared by selectively injecting any one(s) of four chemical agents into the mixing valve assemblyby way of on-off control of the inlet valveand the injection valves and blending together the injected chemical agents. Then, the chemical formulation is pumped into SCF by a high-pressure pumpsuch that the SCF and the chemical formulation are mixed together to form a process fluid. Thus, the number of components of a high-pressure portion can be reduced to achieve a cost reduction of an apparatus. Furthermore, a pipe line for pumping the chemical agents is simplified.

High-pressure processing apparatus and high-pressure processing method

Mixing bathsA andB which temporarily hold chemical agents A and B respectively are disposed. The mixing bathsA andB are each connected with a high-pressure fluid supplying unit. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unitto the mixing bathA which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bathA and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve)is opened, the processing fluid is sent into a pressure vessel. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel, using the processing fluid.

After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unitA,B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unitby a primary transport robot. The supercritical drying unitperforms a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

Substrate processing method, substrate processing apparatus and substrate processing system

A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

High pressure processing method

When the hatch of a substrate washing chamberis opened to receive a substrate, certain valves are closed, and a valve is opened, supply COto purge the substrate washing chamberto and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamberso that the COexpels any gas and unwanted air from the substrate washing chamberand the conduits. Thereafter, super critical COis used to wash the substrate and clean the circulation line. The flow of supercritical COis sent to the substrate washing chamber. After flowing through the circulation line, including a circulation channel, it passes through a bypass channelto a decompressor. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bathtogether with the flow.

High pressure processing apparatus and method

When the hatch of a substrate washing chamberis opened to receive a substrate, certain valves are closed, and one valve is opened, to supply COto purge the substrate washing chamberto and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamberso that the COexpels any gas and unwanted air from the substrate washing chamberand the conduits. Thereafter, supercritical COis used to wash the substrate and clean the circulation line. The flow of supercritical COis sent to the substrate washing chamber. After flowing through the circulation line, including a circulation channel, it passes through a bypass channelto a decompressor. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bathtogether with the flow.

High pressure processing apparatus and high pressure processing method

A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed. Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.

High pressure processing apparatus

Separable upper and lower rims of a post-cure tire inflator requiring no upper rim replacing operation which requires much time and labor especially when mounting the upper rim, and also no time and labor for holding a lower rim upward when mounting. In the upper and lower rim for holding the bead section of the tire, a high-pressure air is filled in a cured tire discharged from a tire curing press to thereby inflate and cool the tire; therefore at least the upper rim has stairway-like steps having two or more outer diameters fit to the bead diameters of tires of different sizes and formed by extending a small outer diameter on a large outer diameter.

Growing community of inventors

Hyogo, Japan

Hisanori Oshiba