Fujifilm Corporation

Hisamitsu Tomeba

Akinori Shibuya

Yasumasa Kawabe

Satoru Yamada

Shuhei Yamaguchi

Daisuke Kashiwagi

Takeshi Andou

Masaomi Makino

Kenji Wada

Shohei Kataoka

Hideki Takakuwa

Mitsuhiro Fujita

Kaoru Aoyagi

Makoto Kubota

Mitsuji Yoshibayashi

Michihiro Ogawa

Toshiyuki Saie

Provided are a coloring composition capable of producing a film with suppressed occurrence of striation, and a method for producing a film. The coloring composition includes a coloring agent A, a resin B, a polymerizable compound C, a photopolymerization initiator D, and an organic solvent E, in which the organic solvent E includes an ester-based solvent E1 having a surface tension at 25&#xb0; C. of from 25 mN/m to 35 mN/m, an organic solvent E2 having a surface tension at 25&#xb0; C. of less than 25 mN/m, a ratio of a mass of the ester-based solvent E1 to the mass of the organic solvent E2 is 80:20 to 30:70 in terms of the ratio of the mass of the ester-based solvent E1:the mass of the organic solvent E2, and the organic solvent E contains 50% by mass or more of a combination of the ester-based solvent E1 and the organic solvent E2 with respect to the total mass of the organic solvent E.

Coloring composition and method for producing film

The invention relates to provide an infrared shielding composition that can form an infrared cut filter in which flat coating properties are excellent and the generation of a pattern on the surface is suppressed and that has excellent drying resistance, an infrared cut filter, and a solid-state imaging device. The infrared shielding composition according to the invention includes at least metal containing tungsten oxide particles; a resin binder; a solvent A of which a boiling point is 170&#xb0; C. to 200&#xb0; C. at 1 atm; and a solvent B different from the solvent A, in which a content of the solvent A is 0.1 to 20 mass % with respect to a total mass of the infrared shielding composition.

Infrared shielding composition, infrared cut filter, and solid-state imaging device

An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent.  In Formula (A), Rrepresents a hydrogen atom or an alkyl group, and Lrepresents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond. In Formula (B), Rrepresents a hydrogen atom or an alkyl group, Lrepresents a single bond or a divalent linking group, and Rrepresents a monovalent organic group including an fluorine atom.

Curable composition, method for producing cured film, color filter, light-shielding film, solid-state imaging element, and image display device

Provided are a resin film which exhibits an excellent low reflectivity, a coloring photosensitive composition capable of forming a resin film which exhibits an excellent low reflectivity, a resin film production method, a color filter, a light shielding film, a solid-state imaging element, and an image display device. The resin film of the present invention includes at least two or more resins, a coloring agent, and a photoacid generator, in which the resin film has a peak at which the value of A1/A2 is greater than 0.1 and 2.5 or less in a light scattering measurement of the resin film, in the case where a half-width of the peak is A1 and a scattering angle of a maximum light intensity of the peak is A2 in a spectrum in which a scattering angle is plotted on the horizontal axis and a scattered light intensity is plotted on the vertical axis.

Resin film, coloring photosensitive composition, resin film production method, color filter, light shielding film, solid-state imaging element, and image display device

Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.

Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device

A solid-state image sensor includes a semiconductor substrate, photoelectric conversion elements arranged on a light receiving surface side of the semiconductor substrate and making up pixels, and a filter layer disposed on a light incidence side of the photoelectric conversion elements so as to correspond to the photoelectric conversion elements. The filter layer includes at least red color filters, green color filters, blue color filters and infrared cut-off filters. The infrared cut-off filters are each arranged next to at least one of the red color filters, the green color filters and the blue color filters. The solid-state image sensor suppresses occurrence of deterioration of the spectral characteristics of an adjacent color filter of any of three primary colors.

Solid-state image sensor and its manufacturing method, curable composition for forming infrared cut-off filters, and camera module

Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.

According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n&#x2267;1, m&#x2267;2 and n&#x3c;m.

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith

According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.)R-AX&#x2003;&#x2003;(I)

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species.

Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same

An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a fluorine-containing compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein the acid has a polarity converting group, and the fluorine content of the fluorine-containing compound (A) is 20% or more based on the molecular weight of the fluorine-containing compound (A).

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Haibara-gun, Japan

Hisamitsu Tomeba