Sumitomo Seika Chemicals Co., Ltd.

Hisaaki Kanda

Takeshi Fujiwara

Hiroyuki Shiraishi

Paul Kuad

Yuichi Onoda

Seiji Bando

Masayoshi Miyada

The present invention provides a diaryl sulfone compound represented by Formula (1): wherein Rto Rand Rto Rare the same or different, and each represents hydrogen, C-alkyl, or halogen, and Rrepresents Calkenyl, Calkyl, or aromatic heterocyclic group;

Diaryl sulfone compound, and manufacturing method for same

The present invention provides a diaryl sulfone compound represented by Formula (1) below: wherein Rto Rand Rto Rare the same or different; each represents hydrogen, Calkyl, or halogen; and Ris (thio)glycidyl, acryloyl, or the like; and a method for producing the same. According to the present invention, a novel compound useful as a monomer for producing synthetic resin having a high refractive index and excellent transparency for optical materials can be efficiently produced with a simple production process, using an inexpensive material as a starting material.

An object of the present invention is to provide a method for manufacturing a sulfolene compound, the method being capable of inhibiting generation of polymers. Another object of the present invention is to provide a method for manufacturing a sulfolane compound, the method being capable of controlling inhibition of hydrogenation catalyst activity and smoothly hydrogenating a sulfolene compound. The present invention is a method for manufacturing a sulfolene compound represented by a formula (2), which comprises the step of reacting a conjugated diene compound represented by a formula (1) with sulfur dioxide in the presence of a metallocene compound:  

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Hyogo, Japan

Hisaaki Kanda