Sumitomo Electric Industries, Limited

Hiroyuki Yoshinaga

Jun-ichi Hashimoto

Hideki Yagi

Yukihiro Tsuji

Tsukuru Katsuyama

Junichi Hashimoto

Manabu Shiozaki

Masaki Yanagisawa

Yutaka Onishi

Hirohiko Kobayashi

Kenji Koyama

Kuniaki Ishihara

Kenji Sakurai

Rei Tanaka

Yuji Koyama

A quantum cascade laser includes a laser structure having an output face for emitting laser light in a first direction; and a lens having an entrance surface and a convex surface, the entrance surface receiving the laser light from the output face, and the convex surface emitting the laser light after being condensed by the lens. The laser structure includes a semiconductor substrate and a mesa waveguide provided on a first region of a principal surface of the semiconductor substrate, the mesa waveguide extending in the first direction. The lens includes a semiconductor and is provided on a second region of the principal surface of the semiconductor substrate. The first region and the second region are arranged in the first direction.

Quantum cascade laser

A quantum cascade semiconductor laser includes a laser structure having a first area including an end face, a second area, and a third area; a metal layer provided on a major surface in the third area; a separation area provided on the major surface; and a reflector provided on the laser structure. The reflector includes a dielectric film and a metal reflecting film provided on the end face and the separation area. The separation area has a first portion, a second portion, and a third portion. The metal layer has an edge separated from the end face in the third area. The contact layer has an edge separated from the end face in the third area. The first portion projects more than the second portion over the semiconductor mesa. The third portion projects more than the second portion over the semiconductor mesa.

Quantum cascade semiconductor laser

A vertical cavity surface-emitting laser including: a substrate having a main surface; and a post structure mounted on the main surface. The post structure includes an active layer and a carrier confinement structure. The carrier confinement structure includes a first region and a second region having a higher resistivity than the first region. The first region has an edge, and a first to a third reference line segments. A first length of the first reference line segment is longest among lengths of line segments joining any two points on the edge and extending in a direction of the III-V group semiconductor. The first length is greater than a sum of a second length of the second reference line segment and a third length of the third reference line segment. The third length is smaller than the second length and is zero or more.

Vertical cavity surface-emitting laser

A quantum cascade laser includes: a laser structure having a first region, a second region, and a third region, the first region having an end face; a high-specific resistance region on principal surfaces of the first and second regions; a metal layer on a principal surface of the third region; a dielectric film on the end face and the high-specific resistance region; and a reflective metal film on the dielectric film, the end face and the high-specific resistance region. The first to third regions are arranged in a direction of a first axis. The laser structure has a semiconductor mesa and a semiconductor base that mounts the semiconductor mesa. The high-specific resistance region has a wall or terrace providing a difference in level at a boundary between the first and second regions, the wall or terrace extending in a direction of a second axis intersecting that of the first axis.

Quantum cascade laser, light emitting device, method for fabricating a semiconductor laser

A quantum cascade laser includes: a substrate having a principal surface, a back surface, and a substrate end face, the substrate end face extending along a reference plane intersecting a second direction which intersects the first direction; a semiconductor laminate having a laminate end face extending along the reference plane; a first electrode disposed on the semiconductor laminate; a second electrode disposed on the substrate; a first insulating film disposed on the laminate end face and the first electrode; a metal film disposed on the first insulating film, the laminate end face, the substrate end face, and the second electrode; and a second insulating film disposed on the first electrode, the second insulating film having a part on the first electrode between the metal film and the semiconductor laminate. On the first electrode, the second insulating film has a thickness larger than that of the first insulating film.

A quantum cascade laser comprises: a laser structure including a first region, a second region, and a third region, the first region having an end face; a high-specific resistance region disposed on the first and second regions; a metal layer disposed on the third region; a dielectric film disposed on the end face and the high-specific resistance region; and a reflective metal film disposed on the dielectric film, the end face and the high-specific resistance region. The first to third regions are arranged in order in a direction of a first axis. The laser structure has a terrace on a boundary between the second and third regions, and the laser structure includes a semiconductor mesa and a conductive base. The semiconductor mesa has a core layer, and the conductive base mounts the semiconductor mesa. The high-specific resistance region has a specific resistance larger than that of the conductive base.

Quantum cascade laser, light emitting apparatus, method for fabricating quantum cascade laser

A surface emitting semiconductor laser includes a post disposed on a substrate, the post including an active layer and a distributed Bragg reflector; a first insulating layer disposed on side and top surfaces of the post and on the substrate, the first insulating layer having an opening on the top surface of the post; an electrode disposed in the opening of the first insulating layer; an electric conductor including a pad electrode on the first insulating layer, the electric conductor extending on the first insulating layer to the electrode; and a second insulating layer disposed on the first insulating layer, the electrode, and the electric conductor so as to cover the electrode in the opening of the first insulating layer, the second insulating layer having an opening on the pad electrode, the opening of the second insulating layer having an edge on a top surface of the pad electrode.

Surface emitting semiconductor laser

A quantum cascade laser includes a laser structure including laser waveguide structures and a first terrace region; first electrodes; pad electrodes; and wiring metal conductors. The laser structure includes first, second and third regions arranged in a direction of a first axis. The third region is disposed between the first and second regions. The first region has a first end facet disposed at a boundary between the first and third regions. The first end facet extends in a direction intersecting with the first axis. The second region has a second end facet disposed at a boundary between the second and third regions. The second region includes the laser structure. The pad electrodes are disposed on the first terrace region. The first electrodes are disposed on the laser waveguide structures. Each of the pad electrodes is connected to one of the first electrodes through one of the wiring metal conductors.

A quantum cascade laser integrated device includes: first and second lower semiconductor mesas extending in a direction of a first axis; a covering region disposed on top and side faces of the first and second lower semiconductor mesas, and including first and second upper semiconductor mesas, the first and second upper semiconductor mesas extending in the direction of the first axis on the first and second lower semiconductor mesas, respectively; and first and second electrodes respectively disposed on the upper semiconductor mesas, the first lower semiconductor mesa and the second lower semiconductor mesa each including a quantum cascading core layer, the covering region including a current blocking semiconductor region embedding the first and second lower semiconductor mesas, and a first conductivity-type semiconductor region disposed on the first and second lower semiconductor mesas and the current blocking semiconductor region, and the first conductivity-type semiconductor region including an upper cladding region.

Quantum cascade laser integrated device

A quantum cascade laser includes a substrate having first and second substrate regions arranged along a first axis; a laser structure body including a laser body region having laser waveguide structures extending along the first axis, the laser structure body including first and second regions respectively including the first and second substrate regions, the laser body region having an end facet located at a boundary between the first and second regions, the second region including a terrace extending along the first axis from a bottom edge of the end facet; a plurality of first electrodes disposed on the laser waveguide structures; a plurality of pad electrodes disposed on the terrace; and a plurality of wiring metal bodies each of which includes a first portion on the terrace and a second portion on the end facet. The pad electrodes are connected with the first electrodes through the wiring metal bodies, respectively.

Quantum cascade laser array

A quantum cascade laser includes a substrate having a principal surface; a laser body region disposed on the principal surface, the laser body region including a semiconductor laminate structure having an end facet, the laser body region having a waveguide structure extending along a waveguide axis; and a distributed Bragg reflection region disposed on the principal surface, the distributed Bragg reflection region including low and high refractive index portions that are alternately arranged in a direction of the waveguide axis. The end facet of the semiconductor laminate structure is optically coupled to the distributed Bragg reflection region. Each of the high refractive index portions includes a semiconductor wall including upper and lower portions that are arranged in a direction intersecting with the principal surface of the substrate. The principal surface is disposed between the upper and lower portions. The lower portion includes a part of the substrate.

A quantum cascade laser includes a substrate having first and second regions; a stacked semiconductor layer disposed on the second region, the stacked semiconductor layer including an active layer, the stacked semiconductor layer having a first end facet and a second end facet that constitute a laser cavity; an insulating layer disposed on the first end facet and an upper surface of the stacked semiconductor layer, the insulating layer having an opening on the upper surface; a conductive layer disposed on the insulating layer and in the opening, the conductive layer being in contact with the upper surface through the opening; and a metal layer disposed on the conductive layer on the first end facet and the upper surface. The first end facet of the stacked semiconductor layer is retreated from an end facet of the substrate to a boundary between the first and second regions.

Quantum cascade laser and method for manufacturing quantum cascade laser

A method for producing a semiconductor optical device includes the steps of growing a semiconductor stacked layer including an etch stop layer and a plurality of semiconductor layers on a major surface of a substrate; forming a mask layer on a top surface of the semiconductor stacked layer so that a tip portion of each of protrusions that protrude from the top surface among protrusions generated in the step of growing the semiconductor stacked layer is exposed; etching the protrusion by wet etching using the mask layer; after etching the protrusion by wet etching, removing the protrusion by dry etching; and removing the mask layer from the top surface, after removing the protrusion by dry etching.

Method for producing semiconductor optical device

A method for producing a semiconductor optical device includes the steps of forming a semiconductor region including a ridge structure on a substrate; forming an insulating film on the semiconductor region; forming a non-photosensitive resin region on the insulating film, forming a first mask that defines a scribe area; forming the scribe area by etching using the first mask; after removing the first mask, forming an insulating layer by etching the insulating film, forming an electrode on the ridge structure and the non-photosensitive resin region to produce a substrate product; forming a scribe line on a surface of the semiconductor region in the scribe area of the substrate product; and cutting the product along the scribe line to form a semiconductor laser bar.

Method for producing semiconductor optical device and semiconductor optical device

A method for manufacturing an LD is disclosed. The LD has a striped structure including an optical active region. The striped structure is buried with resin, typically benzo-cyclo-butene (BCB). The method to form an opening in the BCB layer has tri-steps etching of the RIE. First step etches the BCB layer partially by a mixed gas of CFand O, where CFhas a first partial pressure, second step etches the photo-resist patterned on the top of the BCB layer by a mixed gas of CFand O, where CFin this step has the second partial pressure less than the first partial pressure, and third step etches the BCB left in the first step by mixed gas of CFand O, where CFin this step has the third partial pressure greater than the second partial pressure.

Growing community of inventors

Yokohama, Japan

Hiroyuki Yoshinaga