Shin-etsu Chemical Co., Ltd.

Tohoku University

Hiroyuki Yamazaki

Masaki Takeuchi

Daiyu Okafuji

Daijitsu Harada

Masao Ando

Tohru Kubota

Ayumu Kiyomori

Takayuki Honma

Harunobu Matsui

Shuhei Ueda

Masaru Nakagawa

Shunya Ito

Kento Tsukada

Provided is a substrate for transferring microstructures such as a micro LED including an engraved mark. The substrate for transferring microstructures is less likely to cause a recognizing error of the engraved mark to occur in a reading device, and makes it possible to stably and continuously read the engraved mark. A substrate for transferring microstructures includes a synthetic quartz glass substrate and a silicone pressure-sensitive adhesive agent layer provided on a front surface of the synthetic quartz glass substrate. The substrate includes an engraved mark provided in the from surface.

Substrate for transferring microstructures and method for manufacturing the same

An imprint mold-forming substrate is manufactured by providing a starting imprint mold-forming substrate () having a patterned portion () and a non-patterned portion (), providing a table () having a recess (), bonding the substrate () to the table () such that the patterned portion () is received in the recess () of the table to define a space region () between the patterned portion () and the table () such that the patterned portion is not in direct contact with the table, and performing contour machining on the substrate () secured to the table ().

Manufacturing of imprint mold-forming substrate

Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.

Structure for individual authentication, method for producing thereof, and individual authentication method

A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.

Rectangular substrate for imprint lithography and making method

A synthetic quartz glass cavity member () is bonded to a substrate () having an optical device () mounted thereon such that the device may be accommodated in the cavity member. The cavity member () has an inside surface consisting of a top surface () opposed to the device () and a side surface (). The top surface () is a mirror surface and the side surface () is a rough surface.

Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methods

A synthetic quartz glass substrate is machined by bringing a surface of the synthetic quartz glass substrate as the workpiece into contact with and superposing it on a surface of a protective member made of synthetic quartz glass to effect optical contact bonding of the workpiece and the protective member, and passing a cutting tool through the optical contact bonding surfaces. This machining process is able to effectively prevent the generation of microdefects at the cutting tool entry site and extraction site during a cutting operation. Moreover, a fixing agent is not used to join the workpiece and the protective member, and so productivity is high because there is no need for the application and later removal of a fixing agent.

Method for machining synthetic quartz glass substrate

In an imprint mold-forming synthetic quartz glass substrate () of rectangular shape having dimensions Land Lwith L&#x2265;L, a circular region is delineated on the substrate back surface by a circle of radius R with L&#x2212;2R&#x2265;10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than &#x2212;(2R/100,000&#xd7;1) &#x3bc;m.

Imprint mold-forming synthetic quartz glass substrate

An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.

Electronic grade glass substrate and making method

A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.

Rectangular mold-forming substrate

A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided wherein Rand R' are each independently a fluoroalkyl group of 1 to 10 carbon atoms; Ris a hydrogen atom or an aliphatic monovalent hydrocarbon group of 1 to 6 carbon atoms; Rand Rare each independently methyl group or ethyl group; X and Y are each independently an ether linkage or an ester linkage; a and b are each 0 or 1; m, n, and p are each an integer of 0 to 6; q is an integer of 1 to 6 and r is an integer of 0 to 2.

Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold

An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures.

Method for manufacturing electronic grade synthetic quartz glass substrate

An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.

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Joetsu, Japan

Hiroyuki Yamazaki