Ebara Corporation

Coopervision International Holding Company, LP

Asahi Kasei Kabushiki Kaisha

Hiroyuki Ueyama

Junitsu Yamakawa

Takeshi Murakami

Kuniaki Horie

Kenichi Suzuki

Yuji Araki

Akihisa Hongo

Tsutomu Nakada

Fumio Kuriyama

Hidenao Suzuki

Masahito Abe

Atsushi Chono

Charlie Chen

Paul Richardson

Yuwen Liu

Ying Zheng

Yuan Xu

Hiroyuki Shinozaki

Koji Mishima

Mizuki Nagai

Naoaki Ogure

Hiroyuki Kaneko

Kiwamu Tsukamoto

Yukio Fukunaga

Satoshi Sendai

Ryoichi Kimizuka

Junichi Iwata

Prasad Dande

Megumi Maruyama

Mitsunao Shibasaki

Seiichiro Ikawa

Yasushi Isayama

Hong Xue

Provided are a polymer composition that can suppress bubbling during membrane formation and peeling of a laminated membrane and an ion-exchange membrane. The polymer composition is a polymer composition including: a fluorine-containing copolymer including a unit (a) derived from a perfluorovinyl compound having a side chain having an ionic group and a unit (b) derived from a fluoroolefin; and a low molecular weight compound (a) having a functional group represented by &#x2014;COOX (X is H, NH, or a monovalent metal ion), wherein a content of the low molecular weight compound (a) is 600 ppm or less based on a mass of the polymer composition.

Polymer composition and ion-exchange membrane

HEMA-compatible siloxane monomers are described that can be used to manufacture contact lenses that combine the attributes of HEMA-based contact lenses with the high oxygen permeability of silicone hydrogel lenses. Optically clear silicone hydrogel contact lens can be manufactured that comprise a polymeric lens body that is the reaction product of a polymerizable composition comprising: a) at least 25 wt. % of at least one hydroxyalkyl methacrylate; and b) at least 20 wt. % of at least one HEMA-compatible polysiloxane.

Contact lenses made with HEMA-compatible polysiloxane macromers

Optically clear silicone hydrogel contact lenses are described that comprise a polymeric lens body that is the reaction product of a polymerizable composition comprising at least 25 wt. % of at least one hydroxyalkyl methacrylate; and at least 20 wt. % of at least one HEMA-compatible bifunctional polysiloxane comprising at least 6 siloxane groups and having an HLB value of at least 5 and/or a hydroxyl group content of at least 1 wt. %.

PROBLEM TO BE SOLVED To provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof. SOLUTION A hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

Hydrophilic polysiloxane macromonomer, and production and use of the same

A hydrophilic polysiloxane macromonomer containing polyoxyethylene as a hydrophilic side chains pendant to a polysiloxane main chain for imparting transparency, oxygen permeability, and hydrophilic properties to a contact lens is disclosed. The properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

The concentration of a leveler in a plating liquid that is used by a plating apparatus for filling metal such as copper in interconnection trenches and holes defined in the surface of a semiconductor substrate or the like is determined based on a peak area (Ar value) in a peel-off region of the plating liquid measured according to a CV or CVS process.

Method of managing a plating liquid used in a plating apparatus

The plating apparatus has a plating section in which a plating process is performed and a control section for regulating the plating solution. The plating section includes a plating bath containing plating solution, an anode provided in the plating solution, and a plating object serving as a cathode placed in the plating solution opposite the anode. The control section includes a regulating tank for regulating the composition and/or concentration of the plating solution, and a replenishing tank for injecting solution into the plating solution in the regulating tank. The plating apparatus also includes a mechanism for circulating plating solution between the regulating tank in the control section and the plating bath in the plating section. The plating section is installed in a first room, while the control section is installed in a second room, which is separate from the first room Accordingly, contamination in the plating section is prevented.

Plating apparatus

The present invention relates to a substrate plating apparatus for plating a substrate in a plating bath containing plating solution. An insoluble anode is disposed in the plating bath opposite the substrate. The substrate plating apparatus comprises a circulating vessel or dummy vessel provided separate from the plating bath, with a soluble anode and a cathode disposed in the circulating vessel or dummy vessel. An anion exchange film or selective cation exchange film is disposed between the anode and cathode and isolates the same, wherein metal ions are generated in the circulating vessel or dummy vessel by flowing current between the soluble anode and the cathode therein, and the generated metal ions are supplied to the plating bath. The substrate plating apparatus can also comprise an ion exchange film or neutral porous diaphragm disposed between the substrate and anode in the plating bath, wherein the ion exchange film or neutral porous diaphragm divides the plating bath into a substrate region and an anode region.

Substrate plating apparatus and method

Method of measuring the concentration of a leveler in a plating liquid

Substrate plating device

A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO,, SrTiO,and other such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing effects of the vaporizer section to the liquid feed within the vaporization prevention section.

Liquid feed vaporization system and gas injection device

A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO,, SrTiO,and others such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.

Growing community of inventors

Tokyo, Japan

Hiroyuki Ueyama