Dainippon Screen Mfg. Co., Ltd.

Screen Holdings Co., Ltd.

Kabushiki Kaisha Kobe Seiko Sho

Hiroyuki Ueno

Katsumi Watanabe

Shogo Sarumaru

Eiji Fukatsu

Mikio Masuichi

Masakazu Sanada

Kimitsugu Saito

Yoshihiko Sakashita

Yusuke Muraoka

Tomomi Iwata

Hideki Adachi

Ikuo Mizobata

Hisanori Oshiba

Akiyoshi Nakano

Jun Munemasa

Itsuki Kajino

Tomoyuki Komura

Masafumi Kawagoe

Koichi Mukaegaki

Kazuhiro Shoji

Yoshikazu Kago

Takashi Gama

Hideshi Yamane

Masanobu Iwashima

Yasuo Okuyama

Miyoshi Nakajima

Force for biasing a roller member is changed according to the contact state of first and second plate-like bodies during the travel of the roller member. By that, the pressing force per unit area given from the second plate-like body to the first plate-like body during travel is suppressed. An object to be transferred is satisfactorily transferred despite a change in the contact state of the plate-like bodies during the travel of the roller member.

Transfer apparatus and transfer method

The supply of a negative pressure to an opening P(+) adjacent to an opening P() is stopped by switching a suction valve connected to the opening P(+) from an open state to a closed state while keeping a positive pressure valve connected thereto closed. Then, near the opening P(+), a force for holding a blanket becomes gradually weaker against a pressure force in a pressurized space. Associated with that, an air component in the pressurized space flows into a space between a portion of the blanket vertically above the opening P(+) and an upper surface, whereby the blanket portion is lifted from the upper surface and brought into contact with the lower surface of a printing plate. In this way, a contact area is slowly and stably widened while a sudden change of a pressure in the pressurized space SPis suppressed.

Pattern forming apparatus and pattern forming method

A tip section of a discharge nozzleis shaped like a wedge, and projectionswhich further protrude are formed at the tip of the wedge. Lower surfacesof the projectionsdefine a substrate-facing-surface which is brought into proximity to the substrate, and discharge outlet bearing surfaceswhich gradually retract back from the substrate W, are formed as if to rise from the edges of the lower surfacesAt adjacent positions within the discharge outlet bearing surfacewhich are adjacent to the substrate-facing-surface, discharge outletsfor discharging an application liquid are opened. Areas around the discharge outletsand a wall around a fluid feeding pathare integrated with each other.

Pattern forming apparatus

The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process.

Substrate treatment apparatus

After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unitA,B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unitby a primary transport robot. The supercritical drying unitperforms a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

Substrate processing method, substrate processing apparatus and substrate processing system

A transferring apparatus transfers an article to be processed, which is carried by a carrier device, to a holder provided in a processing chamber defined by a processing vessel and adapted to hold the article at a specified processing position. The transferring apparatus includes a temporarily holding member, and transfers the article from the intermediate position to the processing position after receiving the article carried by the carrier device at an intermediate position distanced from the holder and temporarily holding it. The temporarily holding member is retracted to a position in the outside of the processing vessel after the article is transferred.

Method and apparatus for transferring an article to be processed and processing apparatus

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Kyoto, Japan

Hiroyuki Ueno