Mitsubishi Gas Chemical Company, Inc.

Mitsubishi Gas Chemical, Inc.

Hiroyuki Tanagi

Hiroshi Horikoshi

Hiroyasu Tanaka

Kikuo Furukawa

Shoichi Hayakawa

Yoshiaki Yamamoto

Kouhei Takemura

The present invention enables provision of a production method for 1,2,3,5,6-pentathiepane, the method comprising, in the following order, step A for reacting a trithiocarbonate, sulfur, and a methane dihalide together using a phase-transfer catalyst in a multilayer system having a water layer and an organic layer, step B for separating the water layer from the organic layer, and step C for stopping the reaction using an acid.

Production method for 1,2,3,5,6-pentathiepane

The present invention can provide a method for producing 1,2,3,5,6-pentathiepane, comprising Steps A and B:

Method for producing 1,2,3,5,6-pentathiepane

Provided are a novel alicyclic ester compound and a method for producing a compound of general formula (1) at a high yield from a compound of general formula (2) and a compound of general formula (3). An adamantane compound expressed by general formula (2) and a hydroxyalkyl (meth)acrylate ester compound expressed by general formula (3) are reacted with each other by use of a dehydration condensation agent as a catalyst to obtain an alicyclic ester compound expressed by general formula (1).

(Meth)acrylic acid ester compound and production method therefor

Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.

Method for producing novel ali cyclic ester compound, novel alicyclic ester compound, (meth)acrylic copolymer produced by polymerizing said compound, and photosensitive resin composition using said copolymer

The present invention provides a resist or a compound for use as a resist, which is highly sensitive and well-balanced without losing the fundamental physical properties required as a chemically amplified resist (e.g., resolution, line edge roughness (LER)). The present invention is directed to a (meth)acrylate compound represented by general formula (1) and a process for preparation thereof, as well as a (meth)acrylic copolymer obtainable by polymerization of the (meth)acrylate compound of general formula (1) and a photosensitive resin composition thereof: (wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a linear or branched alkyl group containing 2 to 4 carbon atoms, and each Rmay be the same or different and represents a group represented by the following formula (2) or (3), etc.) (provided that formulae (2) and (3) are as defined in the specification of the present application).

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Tokyo, Japan

Hiroyuki Tanagi